Substrate Cleaning Driven Roller Positioning for Slip Reduction
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Solution Overview
Problem
Existing substrate cleaning apparatuses face challenges in accurately measuring rotational speed due to slip between driven rollers and substrates, leading to non-uniform cleaning performance and potential substrate contamination, especially with the miniaturization of semiconductor substrates.
Innovation Solution
A substrate cleaning apparatus with a driven roller positioned opposite to the cleaning mechanism's force direction, reducing slip and contamination risk, and utilizing a rotation detector to accurately measure the rotational speed of the driven roller, while maintaining a balanced force application to prevent substrate deformation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a driven roller is brought into contact with the substrate to measure rotational speed, then rotational speed detection is enabled, but slip occurs between the roller and substrate reducing measurement accuracy
Solution Approach 1:
A marking member is introduced as an intermediary element between the driven roller and substrate. The marking member rotates together with the substrate and provides a detection target for the rotation detector, eliminating the need for direct contact between the roller and substrate. This intermediary approach enables accurate rotational speed measurement without slip-related errors.
Solution Approach 2:
The patent replaces the mechanical contact-based rotational speed detection method with an optical detection system. Instead of relying on mechanical coupling between the driven roller and substrate, the invention uses a rotation detector that optically detects the position of the marking member to determine rotational speed, thereby eliminating mechanical slip.
2Stability of the object's composition
If multiple rollers are brought into contact with the substrate to ensure stable rotation, then rotation stability is improved, but the risk of substrate contamination increases
Solution Approach 1:
The invention extracts the rotation detection function from the substrate contact system. By placing the marking member on the substrate and detecting its position optically, the system separates the measurement function from the mechanical contact function, allowing substrate rotation to be monitored without requiring multiple contact rollers that could contaminate the substrate.
Solution Approach 2:
The patent replaces mechanical contact-based rotation monitoring with an optical detection system. The rotation detector uses light to detect the position of the marking member on the substrate, eliminating the need for multiple mechanical rollers that could transfer dirt and contaminants to the substrate surface.
3Measurement precision
If the pressing force of the driven roller is increased to prevent slip, then rotational speed measurement accuracy improves, but substrate deformation may occur
Solution Approach 1:
The marking member serves as an intermediary that transfers the substrate's rotational information to the detector without requiring mechanical force. The rotation detector reads the position of the marking member optically, eliminating the need for pressing force entirely and thus preventing substrate deformation while maintaining measurement accuracy.
Solution Approach 2:
The invention replaces the mechanical pressing-based detection system with an optical detection system. Instead of using a driven roller that must press against the substrate to prevent slip, the system uses a rotation detector that reads the marking member's position without contact, eliminating the risk of substrate deformation from excessive pressing force.
Data Source
AI summary
A substrate cleaning apparatus and related apparatuses/methods are disclosed. In one embodiment, a substrate cleaning apparatus includes: a first spindle group including a first driving spindle having a first driving roller configured to rotate a substrate and an idler spindle having a driven roller rotated by the substrate; a second spindle group including a plurality of second driving spindles each having a second driving roller configured to rotate the substrate; a cleaning mechanism configured to clean the substrate rotated by the first driving roller and the plurality of second driving rollers; and a rotation detector configured to detect the rotational speed of the driven roller. The driven roller is positioned on the opposite side to a direction in which the substrate receives a force from the cleaning mechanism.


