Substrate Rear-Surface Cleaning With an Inclined Annular Member
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing substrate cleaning apparatuses face challenges in efficiently cleaning the rear surface of substrates, particularly in removing residual cleaning liquids from support pins and peripheral members without additional supply mechanisms.
Innovation Solution
The substrate cleaning apparatus includes a support part, an annular member with an inclined surface, a rotation part, a first supply part for the substrate's rear surface, and a second supply part for the inclined surface, allowing cleaning liquids to flow radially inward or outward due to gravity or centrifugal force, thereby cleaning support pins and peripheral members effectively.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If cleaning liquid is supplied only to the substrate's rear surface, then the substrate is cleaned effectively, but the support pins and peripheral members remain contaminated with residual cleaning liquid
Solution Approach 1:
The inclined surface of the annular member enables cleaning liquid to flow radially inward or outward automatically under gravity or centrifugal force, cleaning the support pins and peripheral members without requiring separate supply mechanisms. The system uses the existing cleaning liquid flow to simultaneously clean multiple components.
Solution Approach 2:
The second supply part supplies cleaning liquid to the inclined surface of the annular member, which then serves dual purposes: cleaning the peripheral members and directing cleaning liquid to clean the support pins. This multi-functional approach eliminates the need for additional dedicated cleaning mechanisms.
2Reliability
If separate supply mechanisms are added to clean support pins and peripheral members, then cleaning completeness is improved, but device complexity increases
Solution Approach 1:
The cleaning function for support pins and peripheral members is merged into the existing cleaning liquid supply system. The second supply part integrates with the first supply part to create a unified system that cleans both the substrate and the supporting components through coordinated liquid flow distribution.
Solution Approach 2:
The inclined surface geometry enables the cleaning liquid to automatically reach and clean the support pins and peripheral members through gravity-driven or centrifugal flow, eliminating the need for additional powered supply mechanisms while ensuring complete cleaning coverage.
3Productivity
If cleaning liquid flows only from central to peripheral portion, then the substrate rear surface is cleaned, but residual liquid accumulates on support pins and peripheral members
Solution Approach 1:
The system dynamically adapts the cleaning liquid flow direction by utilizing the inclined surface of the annular member. Depending on rotation speed and gravity, the liquid can flow radially inward or outward, dynamically adjusting to clean different areas effectively and prevent residual accumulation.
Solution Approach 2:
Instead of the conventional central-to-peripheral flow pattern, the inclined surface enables reverse flow patterns where cleaning liquid can move from peripheral to central regions or flow along the inclined surface to reach support pins, inverting the traditional flow direction to improve cleaning completeness.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables efficient removal of foreign substances from support pins and peripheral members by simply supplying cleaning liquids to the inclined surface, improving cleaning effectiveness without the need for separate supply mechanisms.
Implementation Method 1
When the cleaning liquid is supplied from the supply part to the rear surface of the rotating substrate, the cleaning liquid flows from the central portion to the peripheral portion of the rear surface of the substrate by virtue of a centrifugal force.
Implementation Method 2
allowing cleaning liquids to flow radially inward or outward due to gravity or centrifugal force
Implementation Method 3
allowing cleaning liquids to flow radially inward or outward due to gravity or centrifugal force
Data Source
AI summary
A substrate cleaning apparatus includes: a support part configured to support a substrate by bring into contact with a rear surface of the substrate; an annular member disposed to surround a periphery of the substrate supported on the support part and including an inclined surface that is inclined with respect to a horizontal plane in a diametrical direction of the annular member; a rotation part configured to rotate the support part and the annular member; a first supply part configured to supply a cleaning liquid toward the rear surface of the substrate supported on the support part; and a second supply part configured to supply the cleaning liquid toward the inclined surface.