Substrate Cleaning Load Control for Dual-Surface Cleaning
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Solution Overview
Problem
Existing substrate cleaning devices are inefficient due to the need for synchronized movement of cleaning bodies, limiting the flexibility and effectiveness of the cleaning process.
Innovation Solution
A substrate cleaning device with independent control of cleaning loads applied by first and second cleaners, adjusting the load based on the distance between them to optimize cleaning efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the first cleaning body and the second cleaning body are moved in synchronization to clean overlapping positions, then the substrate can be firmly cleaned by suppressing deflection, but the cleaning procedure is limited and cannot be performed efficiently
Solution Approach 1:
The patent applies dynamics by making the load adjustable based on the distance between cleaners. The controller dynamically adjusts the load applied by the first and second cleaners according to their relative positions, allowing the system to adapt between synchronized mode (for firm cleaning) and independent mode (for efficient cleaning), thus resolving the contradiction between cleaning firmness and efficiency
2Productivity
If the first cleaning body and the second cleaning body are moved independently to increase cleaning flexibility, then the cleaning procedure can be optimized, but the substrate may deflect and cleaning firmness is reduced
Solution Approach 1:
The patent applies parameter changes by adjusting the load parameter based on the distance between cleaners. When cleaners are close together, a larger load is applied to maintain substrate firmness; when they are far apart, a smaller load is applied to allow independent movement. This dynamic parameter adjustment enables both independent movement for efficiency and sufficient load for firmness
Data Source
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AI summary
A substrate cleaning device includes a first cleaner, a second cleaner, a load adjuster and a control device. The first cleaner cleans a first surface of a substrate. The second cleaner cleans a second surface opposite to the first surface of the substrate. The load adjuster adjusts a load to be applied to the substrate by the first cleaner or the second cleaner. The control device controls the load adjuster such that, a first load is applied to the substrate in a case in which a distance between cleaners which is the distance between the first cleaner and the second cleaner in plan view is larger than a predetermined first distance threshold value, and a second load larger than the first load is applied to the substrate in a case in which the distance between cleaners is equal to or smaller than the first distance threshold value.