Substrate Cleaning Flow Regulator for Mist Containment
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Solution Overview
Problem
Existing substrate processing apparatuses face challenges in effectively preventing the scattering and attachment of cleaning liquids and their droplets or mist to the upper surface of the substrate during the cleaning process, leading to potential contamination and non-uniform processing.
Innovation Solution
The substrate processing apparatus incorporates a flow regulation member with a protrusion that faces the substrate's circumferential portion, guiding air flow to suppress the circulation of cleaning liquids and mist, and a sealing mechanism to maintain a sealed environment, combined with an annular member and cover member design to enhance fluid flow control and prevent contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional cleaning apparatus supplies processing liquid to the rear surface of a rotating substrate, then the rear surface is cleaned effectively, but the processing liquid scatters and attaches to the upper surface of the substrate causing contamination
Solution Approach 1:
The cleaning space is segmented into a sealed internal environment by the cover member and flow regulation member, isolating the processing liquid to the rear surface area while preventing its spread to the upper surface. The flow regulation member with protrusion divides the space to control liquid flow paths separately.
Solution Approach 2:
The flow regulation member acts as an intermediary structure between the processing liquid and the substrate upper surface. It regulates and directs the liquid flow to prevent direct contact with the upper surface, serving as a protective barrier that controls fluid dynamics.
2Manufacturing precision
If the substrate rotates during cleaning, then uniform processing is achieved, but mist and droplets scatter more widely increasing contamination risk
Solution Approach 1:
The cover member creates a sealed environment that isolates the rotating substrate and processing liquid from the external atmosphere. This contained environment prevents mist and droplets generated by rotation from scattering outward, effectively containing harmful factors while maintaining uniform processing.
3Device complexity
If no flow regulation structure is provided, then the apparatus structure is simple, but processing liquid circulates to the upper surface causing non-uniform processing
Solution Approach 1:
The flow regulation member with its protrusion segments the internal space to create distinct flow zones. This segmentation guides the processing liquid along controlled paths that prevent circulation to the upper surface, ensuring uniform processing without requiring complex external control systems.
Solution Approach 2:
The flow regulation member utilizes the natural centrifugal force and flow dynamics of the rotating substrate to automatically regulate liquid distribution. The protrusion structure passively directs flow without requiring active control mechanisms, achieving uniform processing through self-regulating fluid dynamics.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively suppresses the scattering of cleaning liquids and mist, reduces substrate warpage, and ensures uniform processing by maintaining a clean internal environment, thereby minimizing foreign material attachment to the substrate's upper surface.
Implementation Method 1
When the cleaning liquid is supplied from the supply unit to the rear surface of the rotating substrate, the cleaning liquid flows from a central portion of the rear surface of the substrate toward a peripheral portion thereof by a centrifugal force.
Implementation Method 2
a flow regulation member having an annular shape and disposed above the cover member. The flow regulation member may include a base portion and a protrusion which directly faces a circumferential portion of the substrate supported on the support unit and protrudes from the base portion toward the circumferential portion of the substrate.
Data Source
AI summary
A substrate processing apparatus includes a support unit, a supply unit, an annular member, a rotation unit, a cover member, and an annular flow regulation member disposed above the cover member. The annular member includes an inclined surface inclined downward toward a center of the annular member in a radial direction. The flow regulation member includes a base portion and a protrusion which faces a circumferential portion of the substrate supported on the support unit and protrudes from the base portion toward the circumferential portion of the substrate. The protrusion overlaps the support unit when viewed in a vertical direction. A lower surface of the protrusion is positioned above an upper surface of the substrate supported on the support unit and positioned below an upper surface of the annular member. An inner circumferential surface of the protrusion is inclined radially outward from an upper side to a lower side.