Dual-Sided Substrate Cleaning with Stage-Center Nozzle Control
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Solution Overview
Problem
Existing substrate processing apparatuses are inefficient in simultaneously cleaning the front and back surfaces of substrates, often requiring complex configurations and increased cleaning time, especially when finer surface irregularities are present, as they may be damaged by ultrasonic cleaning or two-fluid spray methods.
Innovation Solution
A substrate processing apparatus with a disc-shaped stage, holding pins, and nozzles for liquid and gas supply, allowing for sequential cleaning of both surfaces using a controller to manage the position and operation of nozzles for effective cleaning and drying, minimizing damage to the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-generated harmful factors
If ultrasonic waves are applied or fluid is sprayed onto the substrate surface, then contaminants can be removed, but the fine uneven portions on the substrate surface may be damaged
Solution Approach 1:
The patent changes the physical state parameter of the cleaning medium from liquid (ultrasonic/fluid spray) to solid (ice particles). This parameter change allows effective contaminant removal through mechanical impact of ice particles while avoiding the damaging effects of liquid pressure and ultrasonic vibration on fine surface structures.
Solution Approach 2:
The patent utilizes phase transition by converting water to ice particles through a cooling mechanism. The ice particles are generated by cooling water below its freezing point and then fragmenting it. This phase transition enables the cleaning process to use solid ice particles instead of liquid water, resolving the contradiction between effective cleaning and surface protection.
2Object-generated harmful factors
If the substrate is inverted to clean the back surface after front surface cleaning, then contaminants on the back surface can be removed, but the apparatus configuration becomes complicated and cleaning time increases
Solution Approach 1:
The patent makes the cleaning apparatus universal by enabling it to clean both the front surface and back surface of the substrate without requiring physical inversion of the substrate. The same ice particle generation and delivery system is used for both surfaces, eliminating the need for separate cleaning mechanisms or substrate handling changes.
Solution Approach 2:
The patent approaches the back surface cleaning problem from another dimension by delivering ice particles to the back surface through the substrate itself or from below, rather than requiring the substrate to be inverted. This dimensional approach allows simultaneous or sequential cleaning of both surfaces using the same apparatus configuration.
3Object-generated harmful factors
If the substrate is inverted to clean the back surface, then complete cleaning is achieved, but the cleaning time increases
Solution Approach 1:
The patent ensures continuity of useful action by enabling continuous cleaning of both front and back surfaces without interruption for substrate inversion. The ice particle delivery system operates continuously, maintaining cleaning action on both surfaces simultaneously or in rapid succession, thereby reducing total cleaning time while achieving complete cleaning.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient and simultaneous cleaning of both surfaces of substrates, reducing complexity and cleaning time while protecting the substrate's fine irregularities through controlled liquid and gas application.
Implementation Method 1
a cooling nozzle configured to supply a cooling gas from the hole of the stage to the second surface; where when the cooling gas is supplied to the second surface, the controller controls the third driver to dispose the cooling nozzle below the second surface
Data Source
AI summary
A substrate processing apparatus according to an embodiment of the present disclosure includes a stage having a substantially disc-shaped form and including a hole in a center thereof; a roller that contacts a side surface of the stage and rotates the stage; a first liquid nozzle that supplies a first liquid to a first surface of the substrate; a first driver that moves a position of the first liquid nozzle; a second liquid nozzle that supplies a second liquid from the hole of the stage to a second surface of the substrate; a second driver that moves a position of the second liquid nozzle; a cooling nozzle that supplies a cooling gas from the hole of the stage to the second surface; a third driver that moves a position of the cooling nozzle; and a controller that controls the first driver, the second driver, and the third driver.