Substrate Cleaning via Particle Retention Layer Phase Transition
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Solution Overview
Problem
Conventional substrate cleaning methods face challenges in efficiently removing particles from substrates with patterns, as the particle retention layer often remains in clusters, making it difficult to remove without dissolving the layer, which can lead to particles re-adhering to the substrate.
Innovation Solution
A substrate cleaning apparatus and method that uses a processing solution forming a particle retention layer, where the solvent volatilizes to harden, and a removal liquid is applied without altering the solute component, allowing for controlled removal of the layer at a temperature below the alteration point, improving particle removal rates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the particle retention layer is dissolved in a solution to remove particles, then particles can be removed from the substrate, but particles may fall off from the particle retention layer and adhere again to the substrate
Solution Approach 1:
The invention changes the temperature parameter to alter the solubility characteristics of the particle retention layer. By heating the substrate to a temperature higher than the glass transition temperature of the solute component, the particle retention layer transforms from an insoluble state to a soluble state, enabling effective removal without particle re-adhesion
Solution Approach 2:
The invention utilizes the phase transition of the solute component from a glassy state to a rubbery state by heating above its glass transition temperature. This phase transition changes the solubility characteristics, allowing the particle retention layer to be dissolved in the solution and removed effectively
2Reliability
If the particle retention layer is not dissolved in a solution, then particles can be retained on the layer, but it is not easy to remove the particle retention layer from the substrate
Solution Approach 1:
The invention changes the temperature parameter to control the solubility of the particle retention layer. By heating the substrate to a temperature higher than the glass transition temperature of the solute component, the particle retention layer becomes soluble and can be easily removed with a solution
Solution Approach 2:
The invention employs a periodic process where the substrate is first heated to form the particle retention layer in an insoluble state for particle capture, then heated again to a higher temperature to make the layer soluble for removal, alternating between retention and removal states
3Manufacturing precision
If a substrate has a pattern formed thereon, then the pattern becomes more susceptible to damage, but the particle retention layer remains in clusters making removal difficult
Solution Approach 1:
The invention uses temperature parameter changes to control the solubility of the particle retention layer. By heating to a temperature higher than the glass transition temperature, the layer becomes soluble and can be removed uniformly from patterned substrates without leaving clusters, while the brief exposure and controlled conditions protect the pattern from damage
Solution Approach 2:
The invention utilizes the glass transition phase transition of the solute component to enable uniform dissolution of the particle retention layer from patterned substrates. The phase transition allows the layer to dissolve completely rather than remaining in clusters, achieving effective removal while protecting the underlying pattern
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves a higher particle removal rate with minimal damage to the substrate pattern by maintaining the insolubility of the solute component and efficiently removing the particle retention layer in fine pieces, even on substrates with patterns.
Implementation Method 1
The solvent has volatility. The processing solution transforms into a particle retention layer as a result of at least part of the solvent being volatilized from the processing solution supplied onto the substrate and causing the processing solution to solidify or harden.
Implementation Method 2
The solute component contained in the particle retention layer has a property of being altered to become soluble in the removal liquid when heated to a temperature higher than or equal to an alteration temperature.
Data Source
AI summary
A processing solution containing solvent and solute is supplied onto a substrate (9). The processing solution transforms into a particle retention layer as a result of at least part of the solvent being volatilized from the processing solution and causing the processing solution to solidify or harden. The particle retention layer is removed from the substrate (9) by supplying a removal liquid onto the substrate (9). A solute component contained in the particle retention layer is insoluble or poorly soluble in the removal liquid, whereas the solvent is soluble. The solute component contained in the particle retention layer has the property of being altered to become soluble in the removal liquid when heated to a temperature higher than or equal to an alteration temperature. The removal liquid is supplied after the formation of the particle retention layer, without undergoing a process of alternating the solute component.