Substrate Cleaning Apparatus Resistivity Threshold Control
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Solution Overview
Problem
Current substrate cleaning apparatuses of the one-bath type cannot set individual threshold values for resistivity recovery during rinsing processes based on the type of chemical liquid used, leading to potential residual chemical components on semiconductor wafers, which can cause yield and device characteristic issues, particularly in the formation of gate insulation films.
Innovation Solution
The method involves setting and using distinct threshold values for resistivity checks during rinsing processes based on the type of liquid chemical used in the preceding process, ensuring optimal resistivity recovery and complete removal of chemical components, with a substrate cleaning apparatus that includes a processing bath, resistivity measuring part, and a controller to manage the liquid chemical and rinsing processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single threshold value for resistivity is used for all liquid chemical processes, then the device complexity is reduced and operation is simplified, but the manufacturing precision and reliability of substrate cleaning deteriorates due to insufficient removal of chemical components
Solution Approach 1:
The patent applies local quality by setting different threshold values for resistivity based on the specific liquid chemical process being performed. Each liquid chemical process type (SC-1, SC-2, HF, etc.) has its own tailored threshold value that matches the recovery characteristics of that specific chemical, ensuring optimal detection of rinsing completion for each case.
Solution Approach 2:
The patent changes the parameter of resistivity threshold values from a single fixed value to multiple variable values that are selected based on the liquid chemical process type. The controller dynamically adjusts the threshold value parameter according to the process recipe, allowing precise adaptation to different chemical recovery curves.
2Productivity
If the rinsing process is completed based on a fixed threshold value, then the process time is reduced and productivity is improved, but the reliability of chemical removal deteriorates when the threshold does not match the actual resistivity recovery
Solution Approach 1:
The patent implements feedback by continuously monitoring the resistivity of the liquid during rinsing and comparing it against the appropriate threshold value. The controller uses this feedback to determine when rinsing is complete, ensuring reliable detection of chemical removal while maintaining efficient process timing.
Solution Approach 2:
The patent introduces dynamics by making the threshold value adaptable rather than fixed. The threshold value is dynamically selected based on the liquid chemical process type, allowing the system to respond appropriately to different resistivity recovery patterns of various chemicals.
3Ease of operation
If a single threshold value is used for all processes, then the ease of operation is improved, but the adaptability to different chemical types deteriorates
Solution Approach 1:
The patent achieves universality by creating a multi-functional threshold value system that automatically adapts to different liquid chemical processes. The controller is designed to handle multiple process types (SC-1, SC-2, HF, etc.) with a single unified system that selects the appropriate threshold value based on the process recipe, eliminating the need for manual reconfiguration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach ensures proper completion of rinsing processes by using tailored threshold values for each chemical type, reducing the risk of residual chemicals and improving the reliability and yield of semiconductor device manufacturing by ensuring thorough removal of liquid chemical components.
Implementation Method 1
measures the resistivity of the deionized water stored in the processing bath
Data Source
AI summary
A substrate cleaning apparatus is capable of individually setting a threshold value for use in making a check of a resistivity during a rinsing process on a recipe setting screen in each process step. Thus, by setting each threshold value depending on the type of liquid chemical to be used immediately before the rinsing process, the substrate cleaning apparatus can use an optimum threshold value during the rinsing process in each process step to make a check of the resistivity. This allows the proper completion of the rinsing process in each process step.