Substrate Cleaning via Insoluble Particle Retention Layer Removal
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Solution Overview
Problem
Conventional substrate cleaning methods face challenges in efficiently removing particles from substrates with patterns, as the particle retention layer often remains in clusters, making it difficult to remove without dissolving the layer, which can lead to particles re-adhering to the substrate.
Innovation Solution
A substrate cleaning apparatus and method that uses a processing solution forming a particle retention layer, where the solvent volatilizes to harden, and a removal liquid is supplied without altering the solute component, allowing for controlled removal of the layer at a temperature below the alteration point, improving particle removal rates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the particle retention layer is dissolved in a solution to remove particles, then particles can be removed from the substrate, but particles may fall off from the particle retention layer and adhere again to the substrate
Solution Approach 1:
The invention changes the temperature parameter to alter the solubility characteristics of the particle retention layer. By heating the substrate to a temperature above the alteration temperature, the solute component transforms from insoluble to soluble state, enabling effective dissolution and removal of the particle retention layer without particle re-adhesion
Solution Approach 2:
The invention utilizes a phase transition of the solute component in the particle retention layer. The solute transitions from an insoluble phase at lower temperatures to a soluble phase at elevated temperatures, allowing controlled dissolution and removal of particles from the substrate
2Reliability
If the particle retention layer is not dissolved in a solution, then particles can be removed from the substrate, but it is not easy to remove the particle retention layer from the substrate
Solution Approach 1:
The invention applies temperature parameter changes to transform the particle retention layer's properties. By heating above the alteration temperature, the solute component becomes soluble, converting the difficult-to-remove insoluble layer into an easily removable soluble layer
3Manufacturing precision
If a substrate has a pattern formed thereon, then manufacturing precision is improved, but it is difficult to remove the particle retention layer from the substrate without dissolving the particle retention layer in a solution
Solution Approach 1:
The invention uses temperature parameter changes to solve the removal difficulty on patterned substrates. By heating above the alteration temperature, the solute component becomes soluble, enabling easy removal of the particle retention layer from complex patterned surfaces without mechanical damage
Solution Approach 2:
The invention exploits the phase transition of the solute component from insoluble to soluble state at elevated temperatures. This allows the particle retention layer to be easily removed from patterned substrates by dissolution, avoiding mechanical removal methods that could damage the patterns
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the particle removal rate by maintaining the insolubility of the solute component, preventing re-adhesion and effectively removing particles from substrates with patterns without damaging the substrate, outperforming traditional methods.
Implementation Method 1
The solvent has volatility. The processing solution transforms into a particle retention layer as a result of at least part of the solvent being volatilized from the processing solution supplied onto the substrate and causing the processing solution to solidify or harden.
Implementation Method 2
The solute component contained in the particle retention layer has a property of being altered to become soluble in the removal liquid when heated to a temperature higher than or equal to an alteration temperature.
Data Source
AI summary
A processing solution containing solvent and solute is supplied onto a substrate (9). The processing solution transforms into a particle retention layer as a result of at least part of the solvent being volatilized from the processing solution and causing the processing solution to solidify or harden. The particle retention layer is removed from the substrate (9) by supplying a removal liquid onto the substrate (9). A solute component contained in the particle retention layer is insoluble or poorly soluble in the removal liquid, whereas the solvent is soluble. The solute component contained in the particle retention layer has the property of being altered to become soluble in the removal liquid when heated to a temperature higher than or equal to an alteration temperature. The removal liquid is supplied after the formation of the particle retention layer, without undergoing a process of alternating the solute component.