Substrate Cleaning Device with Space Forming Member for Contaminant Removal

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Solution Overview

Problem

Existing substrate cleaning devices fail to effectively remove contaminants from the lower surface of substrates and prevent their re-adherence, as contaminants often remain in the cleaning brush, leading to reduced cleanliness and potential processing defects during lithography and semiconductor manufacturing.

Innovation Solution

A substrate cleaning device with a rotation holder, a lower surface cleaning mechanism using a cleaner with a circular upper end surface, and a cleaner cleaning mechanism featuring a space forming member with a circular opening, allowing cleaning liquid to flow out and remove contaminants from the cleaner's outer peripheral end, thereby preventing re-adherence to the substrate.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a cleaning brush is used to clean the lower surface of the substrate, then contaminants adhering to the lower surface can be removed, but the contaminants remain in the surface or inside of the cleaning brush and may re-adhere to the substrate

Engineering Contradiction:

Improvecleanliness of substrate lower surfaceVSAvoidre-adherence of contaminants to substrate

Core Design Contradiction:

Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent extracts the cleaning function from the substrate cleaning process and applies it to the cleaning brush itself. The cleaning liquid supply system is directed to supply cleaning liquid to the cleaning brush, separating the brush cleaning function from the substrate cleaning function. This allows contaminants to be removed from the brush surface and prevented from re-adhering to the substrate.

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The patent introduces cleaning liquid as an intermediary substance between the cleaning brush and contaminants. The cleaning liquid flows over the cleaning brush surface, carrying away contaminants that have been removed from the substrate. This intermediary medium prevents direct contact between the contaminated brush and the substrate, eliminating the re-adherence problem.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Object-generated harmful factors

If cleaning liquid is supplied towards the cleaning brush, then contaminants in the cleaning brush can be cleaned away, but the cleaning liquid may not effectively reach and clean the outer peripheral end of the cleaner where contaminants primarily remain

Engineering Contradiction:

Improvecontaminants in cleaning brushVSAvoideffective cleaning of cleaner outer peripheral end

Core Design Contradiction:

Object-generated harmful factorsVSEase of operation

Solution Approach 1:

The patent employs asymmetric cleaning liquid supply by directing the cleaning liquid flow specifically towards the outer peripheral end of the cleaning brush where contaminants primarily accumulate. The cleaning liquid supply nozzle is positioned and oriented to create a focused flow pattern that targets the most contaminated areas, rather than providing uniform cleaning across the entire brush surface.

Inventive Principle:

Principle #4Asymmetry

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The device effectively removes contaminants from the substrate's lower surface and reduces re-adherence, enhancing the cleanliness of both the substrate and the cleaning brush, thereby minimizing processing defects and improving the formation of finer patterns.

Implementation Method 1

a cleaning liquid supply system that allows a cleaning liquid to flow out from the inner space through the circular opening and a gap between the upper end surface of the cleaner and the lower end surface of the space forming member by supplying the cleaning liquid to the inner space of the space forming member

Methodology Applied

Scientific EffectFluid flow:

Implementation Method 2

the contaminants that have been removed from the lower surface of the substrate are likely to remain in the outer peripheral end of the upper end surface of the cleaner. Then, the cleaner is cleaned by the cleaner cleaning mechanism

Methodology Applied

Scientific EffectWashing:

Data Source

PatentUS10331049B2Substrate cleaning device and substrate processing apparatus including the same

Publication Date: 2019.06.25 SCREEN HOLDINGS CO LTD

AI summary

A substrate cleaning device includes a cleaning brush having a circular upper end surface, and cleans a lower surface of a substrate by bringing the upper end surface of the cleaning brush into contact with the lower surface of the substrate rotated by a spin chuck. A space forming member is provided for cleaning of the cleaning brush. The space forming member has a lower end surface. Further, the space forming member has a circular opening in a lower end surface and forms an inner space. A cleaning liquid is supplied to the inner space of the space forming member with the circular opening closed by the upper end surface of the cleaning brush, whereby the cleaning liquid is allowed to flow out from the inner space through the circular opening and a gap between the upper end surface of the cleaning brush and the lower end surface of the space forming member.