Substrate Cleaning Device Vertical Tool Motion
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Solution Overview
Problem
Existing substrate cleaning devices face challenges in reducing their footprint while ensuring effective cleaning of the entire lower surface of substrates, as they require movement of large components, leading to increased size and potential contamination from splashed cleaning liquids.
Innovation Solution
A substrate cleaning device design featuring a first and second substrate holder, a mover, a cleaning tool, and a rotation driver, which allows for cleaning of the entire lower surface without horizontal movement of the substrate, using a cleaning tool lifter-lowerer to adjust cleaning heights and an airflow generator to prevent contamination, and a cleaning liquid supplier to efficiently apply and contain the cleaning liquid.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If the substrate is moved horizontally to clean different regions, then the cleaning coverage is improved, but the device footprint increases
Solution Approach 1:
The patent transitions from horizontal substrate movement to vertical cleaning tool movement. The cleaning tool is positioned above the substrate and moved vertically to contact different regions (center and peripheral portions) of the substrate surface, eliminating the need for large horizontal movement space while maintaining comprehensive cleaning coverage.
Solution Approach 2:
Instead of moving the substrate horizontally under a fixed cleaner, the patent inverts the approach by moving the cleaning tool vertically onto the substrate. This reversal of motion direction allows the same cleaning function to be achieved with reduced horizontal space requirements.
2Area of stationary object
If the upper cup is removed to reduce device size, then the footprint is reduced, but cleaning liquid splashing increases
Solution Approach 1:
The patent introduces a cleaning tool as an intermediary between the cleaning liquid supply system and the substrate. The cleaning tool is selectively positioned to contact the substrate surface, controlling the application and containment of cleaning liquid, thereby preventing splashing while enabling effective cleaning without requiring the upper cup structure.
Solution Approach 2:
The cleaning tool's position is dynamically adjusted - it can be lowered to contact the substrate for cleaning and raised to disconnect. This dynamic positioning allows cleaning liquid to be applied precisely where needed and contained effectively, preventing splashing even without the upper cup's physical barrier.
3Productivity
If the cleaning tool contacts the substrate during horizontal movement, then cleaning is performed, but the device size increases
Solution Approach 1:
The patent changes the cleaning motion from horizontal substrate movement to vertical cleaning tool movement. The cleaning tool moves vertically to contact the substrate at different positions, achieving comprehensive cleaning coverage without requiring large horizontal movement space, thus maintaining high cleaning efficiency with a compact footprint.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the cleaning of the entire lower surface of substrates with reduced footprint and maintains high cleanliness by preventing splashing and contamination, while efficiently using cleaning liquids and minimizing the need for horizontal substrate movement.
Implementation Method 1
a second substrate holder that holds a lower-surface center portion of the substrate by suction
Implementation Method 2
a cleaning tool that comes into contact with a lower surface of the substrate to clean the lower surface of the substrate
Implementation Method 3
a rotation driver that supports the second substrate holder from below and rotates the second substrate holder about an axis extending in an up-and-down direction
Implementation Method 4
a base mover that moves the base portion between a first horizontal position at which the second substrate holder is opposite to the lower-surface center portion of the substrate and the cleaning tool is opposite to the lower-surface outer region surrounding the lower-surface center portion of the substrate, and a second horizontal position at which the second substrate holder is opposite to the lower-surface outer region of the substrate and the cleaning tool is opposite to the lower-surface center portion of the substrate
Data Source
AI summary
A first substrate holder holds an outer peripheral end of a substrate. A second substrate holder holds a lower-surface center region of the substrate by suction at a position farther downward than the first substrate holder. The second substrate holder and the lower-surface brush are provided on a mobile base that is movable in a horizontal direction. The mobile base is moved between a position at which the lower-surface brush is opposite to a lower-surface outer region of the substrate and a position at which the lower-surface brush is opposite to the lower-surface center region of the substrate. The lower-surface center region of the substrate held by the first substrate holder is cleaned. At this time, a height position of the substrate is higher than an upper end portion of a processing cup. The lower-surface outer region of the substrate held by the second substrate holder is cleaned. At this time, a height position of the substrate is lower than the upper end portion of the processing cup.