Substrate Coater Layout for Compact Post-Processing Lines
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing substrate processing apparatuses and systems face challenges in reducing footprint enlargement when performing both coating processes and subsequent post-processes, leading to increased size and energy consumption.
Innovation Solution
A substrate processing apparatus is designed with a coater positioned separately from the substrate loader/unloader in a first horizontal direction, and post-processors arranged perpendicular to the transport path in a second horizontal direction, allowing for compact arrangement and efficient substrate transport.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If pre-processing devices and post-processing devices are arranged linearly with the coating device, then comprehensive processing capabilities are achieved, but footprint enlargement occurs
Solution Approach 1:
The patent transitions from a linear one-dimensional arrangement to a two-dimensional planar layout. The coater is positioned at a first location, the substrate loader/unloader at a second location, and post-processors at a third location that is offset in a direction different from the line connecting the first two locations. This dimensional change allows all processing functions to coexist within a compact footprint while maintaining comprehensive processing capabilities.
2Area of stationary object
If multiple processing devices are arranged in a compact configuration, then footprint is reduced, but operational efficiency may deteriorate
Solution Approach 1:
The substrate transporter is configured to be movable between different positions, enabling dynamic adaptation to various processing sequences. The transporter can selectively position substrates at different locations based on which post-processing operations are needed, allowing the system to maintain high operational efficiency despite the compact arrangement. This dynamic positioning capability ensures that substrates can be efficiently moved between the coater, loader/unloader, and various post-processors without excessive travel distances.
Data Source
AI summary
A substrate processing apparatus includes a coater and a plurality of post-processors. The coater is configured to perform the coating process at a position separated from a substrate loader/unloader in a first horizontal direction. The post-processors are configured to perform a predetermined post-process on the substrate after being subjected to the coating process. The substrate is transported back and forth along a linear transport path formed between the substrate loader/unloader and the coater. The post-processors are arranged separately with respect to the transport path in the second horizontal direction perpendicular to the first horizontal direction. As a result, the compactness of the substrate processing apparatus is achieved in the first horizontal direction and the second horizontal direction.