Substrate Container Deflector Layout for Purging Gas Flow
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Solution Overview
Problem
Existing substrate containers face challenges in effectively purging undesirable gases, such as moisture, due to inefficient gas flow patterns, which can lead to suboptimal storage and etching conditions for semiconductor wafers.
Innovation Solution
Incorporating deflectors within the substrate container to improve the gas flow pattern by directing purging gas more effectively towards the substrates, enhancing the purging efficacy by using a gas distributor that channels gas through a longitudinal opening and deflection surface, and stabilizing the deflector and gas distributor to maintain optimal positioning.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a gas distributor is used to introduce purging gas into the substrate container, then purging function is provided, but the gas flow pattern is inefficient and purging efficacy is suboptimal
Solution Approach 1:
A deflector is introduced as an intermediary component between the gas distributor and the substrate container interior. The deflector has a deflection surface that redirects the purging gas flow, and a longitudinal opening that allows controlled gas passage. This intermediary structure transforms the inefficient direct flow into an optimized flow pattern that enhances purging efficacy while maintaining system simplicity.
2Reliability
If the deflector is positioned to direct gas flow toward substrates, then purging efficacy improves, but the positioning and stability of the deflector and gas distributor become critical
Solution Approach 1:
The deflector, gas distributor, and substrate container are designed with complementary geometric features that create a self-aligning system. The deflector fits into a corresponding receptacle in the substrate container, and the gas distributor connects to the deflector in a manner that maintains optimal positioning. This equipotential design ensures stable positioning without requiring complex active control mechanisms, as the geometric constraints naturally maintain the optimal configuration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The improved gas flow pattern results in more efficient removal of unwanted vapors and particles, enhancing the purging efficacy and maintaining optimal storage conditions for semiconductor wafers.
Implementation Method 1
The deflector is configured to direct a gas flow pattern of the purging gas from the gas distributor to an outlet of the substrate container to improve purging efficacy of the substrate container
Implementation Method 2
The longitudinal opening is disposed to direct the purging gas toward a central volume of the interior of the substrate container
Data Source
AI summary
A container includes a deflector, disposed in an interior of a substrate container, having a longitudinal opening and a deflection surface and a gas distributor configured to provide a purging gas to purge an interior of a substrate container. The gas distributor is configured such that at least a portion of the purging gas flows into a gap formed between the gas distributor and the deflector. The deflector is configured such that at least a portion of the purging gas in the gap flows through the longitudinal opening. The deflector directs a gas flow pattern of the purging gas from the gas distributor to an outlet of the substrate container to improve purging efficacy of the substrate container.