Substrate Container Flow Field Layout for Vertical Gas Diffusion
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Solution Overview
Problem
Existing substrate containers have inadequate airflow distribution, leading to weak gas flow above substrates, which fails to effectively remove moisture, dust, and residual heat, and the addition of special gas channels reduces storage space, increasing costs.
Innovation Solution
A substrate container design featuring an offset inflation mechanism and gas diffusion mechanism with a gaseous chamber and auxiliary chamber system that creates a strong vertical gas flow from the back to the front, enhancing airflow without occupying storage space.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Speed
If special gas channels are provided to enhance the flow field, then the gas flow strength is improved, but the storage space of the substrate container is reduced
Solution Approach 1:
The gas diffusion mechanism redirects gas flow from horizontal movement at the bottom to vertical movement through the substrate stack. By introducing vertical gas channels and diffusion members that extend upward, the system utilizes the height dimension to create strong gas currents above substrates without occupying horizontal storage space. The offset inflation mechanism positioned at the rear corner further exploits three-dimensional space configuration to achieve enhanced flow field while maintaining storage capacity.
2Object-affected harmful factors
If gas flow is blown from the bottom of the substrate container, then remaining moisture and dust are removed, but the gas current above the first piece of substrate is very weak or stalls
Solution Approach 1:
The gas diffusion mechanism acts as an intermediary between the offset inflation mechanism and the substrates. It receives gas from the inflation mechanism and redistributes it through vertical channels and diffusion members, creating multiple gas flow paths that ensure strong gas currents reach above all substrates. This intermediary structure transforms the weak horizontal flow into strong vertical flow patterns that effectively remove moisture and dust from all substrate surfaces.
3Speed
If the inlet and box are disposed on opposing sides of the gaseous chamber, then gas flow distribution is improved, but the device complexity increases
Solution Approach 1:
The gas diffusion mechanism is segmented into distinct functional components: the offset inflation mechanism, vertical gas channels, diffusion members, and front cover outlets. This segmentation allows each component to perform its specific function efficiently while simplifying the overall design. The modular structure enables independent optimization of each segment and facilitates manufacturing and assembly, reducing complexity despite the improved gas flow distribution achieved through the opposing sides configuration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The enhanced airflow effectively removes moisture, dust, and residual heat, maintaining substrate quality while maintaining storage capacity and reducing costs.
Implementation Method 1
an offset inflation mechanism (2) disposed outside the internal receiving space (S) and having a gaseous chamber (21) extending in the same direction as the bottom panel (13), wherein an inlet (211) is disposed at an end of the gaseous chamber (21), wherein the inlet (211) and the box (1) are disposed on two opposing sides of the gaseous chamber (21), respectively
Implementation Method 2
at least one gas diffusion mechanism (3) adjoining the back panel (12) and comprising a base (31), a partition wall (32) and at least one diffusion member (33)
Data Source
AI summary
A substrate container with enhanced flow field therein includes a box, at least one offset inflation mechanism and at least one gas diffusion mechanism. The offset inflation mechanism is disposed outside internal receiving space of the box. The offset inflation mechanism has a gaseous chamber extending in the same direction as a bottom panel. The gas diffusion mechanism includes a base, a partition wall and at least one diffusion member. The base masks an outlet of the gaseous chamber to form an auxiliary gaseous chamber. The partition wall extends perpendicularly to the bottom panel to form a vertical first gas channel in communication with the auxiliary gaseous chamber. The diffusion member and the partition wall together define a second gas channel. The partition wall has at least one gap whereby the first gas channel and the second gas channel are in communication with each other.