Substrate Storage Container Gas Path Layout for Cleaner Drying

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Solution Overview

Problem

Conventional substrate storage containers face issues with cleaning liquid remaining in the gas supply mechanism during the cleaning process, leading to potential contamination and oxidation of substrates.

Innovation Solution

The substrate storage container design includes a gas supply mechanism with a check valve and flow path positioned to prevent direct exposure to cleaning liquids, ensuring that the cleaning liquid does not readily remain in the mechanism, with the flow path directing liquids away from the filter structure to facilitate easy drying and discharge.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the gas supply mechanism is provided on the bottom surface for introducing gas, then gas replacement function is achieved, but cleaning liquid tends to remain in the gas supply mechanism

Engineering Contradiction:
Improvegas replacement functionVSAvoidcleaning liquid remaining
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The check valve is positioned at a location that does not overlap with the introduction path when viewed from the horizontal direction, creating a spatial separation in three-dimensional space. This dimensional arrangement ensures that cleaning liquid flowing through the introduction path does not directly contact the check valve, while gas can still reach the check valve through the flow path, thus resolving the contradiction between gas replacement function and prevention of cleaning liquid accumulation.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Object-affected harmful factors

If the check valve is positioned to prevent cleaning liquid contact, then contamination risk is reduced, but gas supply path becomes more complex

Engineering Contradiction:
Improvecontamination riskVSAvoidgas supply mechanism structure
Core Design Contradiction:
Object-affected harmful factorsVSDevice complexity

Solution Approach 1:

The gas supply mechanism integrates multiple functions into a unified structure: the introduction path serves as both a gas introduction channel and a cleaning liquid drainage path, while the flow path simultaneously supplies gas to the check valve and provides a drainage route for cleaning liquid. This merging of functions reduces the need for separate components and simplifies the overall structure despite the non-overlapping spatial arrangement.

Inventive Principle:
Principle #5Merging (Combining)

Data Source

PatentUS12187528B2Substrate storage container
Publication Date: 2025.01.07 SHIN ETSU POLYMER CO LTD
  • US12187528B2 patent drawing
  • US12187528B2 patent drawing
  • US12187528B2 patent drawing

AI summary

A substrate storage container includes: an opening on a front surface side; and a gas supply mechanism on a bottom surface. The gas supply mechanism has: an introduction path configured to receive a gas from a bottom surface side; a check valve disposed at a position that does not overlap with the introduction path in a horizontal plane along the bottom surface; and a flow path configured to supply the gas from the introduction path to the check valve.