Substrate Container Purge Flow Layout for Uniform Inert Gas Distribution
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Solution Overview
Problem
In semiconductor manufacturing, substrate containers with front openings face issues with gas ingress and humidity/oxygen level increases during purge processes, affecting the cleanliness of the microenvironment.
Innovation Solution
A purge flow distribution system that divides a stream of purge gas into multiple discrete input ports within the substrate container, using a network of gas distributing devices and a supply line to manage gas flow and prevent external gas ingress.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single purge gas inlet is used in the substrate container, then the device complexity is reduced, but the gas distribution uniformity and purging effectiveness deteriorate
Solution Approach 1:
The single purge gas inlet is segmented into multiple discrete input ports distributed throughout the container. This segmentation allows purge gas to be introduced at multiple locations simultaneously, creating more uniform gas distribution and improving purging effectiveness without requiring a complex centralized distribution system.
Solution Approach 2:
The purge gas distribution is transitioned from a single-point (0D) or line (1D) inlet to a distributed multi-point configuration across the container volume (3D). This dimensional change enables comprehensive gas distribution throughout the container interior, ensuring effective purging of all regions.
2Ease of operation
If the substrate container front opening is open during processing, then the ease of operation is improved, but external gas ingress and humidity increase worsen
Solution Approach 1:
Purge gas is introduced into the container before and during the opening operation to create a protective gas atmosphere. This preliminary anti-action prevents external gas and humidity from entering the container interior, countering the harmful effects that would otherwise occur when the front opening is open for substrate access.
Solution Approach 2:
A continuous stream of inert purge gas (such as nitrogen) is maintained within the container to create an inert atmosphere that displaces external air. This inert environment prevents oxidation and contamination even when the container is open, allowing easy operation while protecting against harmful external factors.
3Reliability
If purge gas flow rate is increased, then the purging effectiveness is improved, but the energy consumption and gas usage increase
Solution Approach 1:
The total purge gas flow is segmented and distributed through multiple discrete input ports rather than using a single high-flow inlet. This segmentation allows the same total gas volume to be distributed more efficiently across multiple locations, improving purging effectiveness throughout the container while maintaining moderate overall gas consumption and energy usage.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This system effectively maintains a clean environment by ensuring purge gas is distributed efficiently within the container, minimizing external gas ingress and maintaining optimal humidity and oxygen levels.
Implementation Method 1
a supply line connected to the inlet that is configured to divide the stream of purge gas to the network of separate gas distributing devices
Implementation Method 2
a network of separate gas distributing devices configured to distribute the stream of purge gas into the interior space
Data Source
AI summary
A substrate container includes a shell defining an interior space and a purge flow distribution system. The shell includes a front opening, a bottom wall, and a rear wall. The purge flow distribution system receives a stream of purge gas and includes an inlet and a network of separate gas distributing devices configured to distribute the stream of purge gas into the interior space. A supply line is also included that is connected to the inlet and configured to divide the supply of purge gas to the network of separate gas distributing devices. A method of purging an open substrate container includes supplying a stream of purge gas to an inlet of a purge flow distribution system and dividing the purge gas to supply a network of separate gas distributing devices to distribute the stream of purge gas into the interior space.