Substrate Container Manifold Layout for Stable Purge Gas Distribution

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Solution Overview

Problem

During substrate processing, the introduction of gas through an equipment front end module (EFEM) can increase relative humidity and oxygen levels within the substrate container, interfering with the purging capabilities.

Innovation Solution

A substrate container with a manifold system that supplies purge gas through multiple inlet ports, including a first stream closer to the front opening and a second stream closer to the rear wall, distributing the gas to counteract the ingress of external gas and maintain a stable environment.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-affected harmful factors

If purge gas is supplied to counteract external gas ingress, then contamination is reduced, but system complexity increases

Engineering Contradiction:
Improvecontamination ingressVSAvoidmanifold system complexity
Core Design Contradiction:
Object-affected harmful factorsVSDevice complexity

Solution Approach 1:

The manifold is segmented into distinct front and rear gas supply pathways with separate inlet ports. This segmentation simplifies the control architecture by allowing independent regulation of each gas supply, reducing the complexity of flow management while effectively preventing contamination ingress through coordinated operation of the segmented supplies.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The manifold system effectively maintains a stable internal environment by distributing purge gas, reducing the ingress of external contaminants and maintaining desired humidity and oxygen levels.

Implementation Method 1

a manifold distributing the purge gas within an interior space

Methodology Applied
Scientific EffectGas distribution:

Implementation Method 2

supplying a first stream of purge gas to an inlet of a manifold within the substrate container... supplying a second stream of purge gas to the interior space

Methodology Applied
Scientific EffectPressure differential: Pressure Gradient

Data Source

PatentUS20260033283A1Manifold for a substrate container
Publication Date: 2026.01.29 ENTEGRIS INC
  • US20260033283A1 patent drawing
  • US20260033283A1 patent drawing
  • US20260033283A1 patent drawing

AI summary

A substrate container includes a shell defining an interior space and a manifold with an inlet and a gas distributing surface. The shell includes a front opening, a bottom wall, and a rear wall. The manifold is attached to the bottom wall and is closer to the front opening than the rear wall. The gas distributing surface is configured to distribute purge gas into the interior space. A method of purging an open substrate container includes supplying a first stream of purge gas to a manifold and supplying a second stream of purge gas to an interior space of the substrate container. The method also including the manifold distributing the purge gas of the first stream within the interior space of the substrate container.