Substrate Processing Cup Cleaning via Overflow Mechanism
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In substrate processing apparatuses, residual processing liquids can react to form foreign matters like crystals, which adhere to the peripheral wall portions of cups, leading to contamination and processing inefficiencies.
Innovation Solution
A substrate processing apparatus is designed with a cleaning liquid supply unit that overflows cleaning liquid from the peripheral wall portion to an adjacent cup, effectively cleaning the peripheral wall and removing attached foreign matters by using a mixed solution of sulfuric acid and hydrogen peroxide, and incorporating a heat exchange unit to enhance cleaning efficacy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple cups are disposed adjacent to each other to recover different processing liquids, then the substrate processing apparatus can handle multiple processing liquids simultaneously, but residual processing liquids from adjacent cups can react to form foreign matters that adhere to the peripheral wall portions
Solution Approach 1:
The invention extracts the harmful residual processing liquids from the recovery portion by introducing cleaning liquid that flows through the peripheral wall portion, separating the cleaning function from the recovery function to prevent foreign matter formation
Solution Approach 2:
The invention introduces cleaning liquid as an intermediary substance that mediates between the residual processing liquids in adjacent cups, preventing their direct contact and chemical reaction by flushing through the peripheral wall portion
2Reliability
If cleaning liquid is supplied to the recovery portion to clean the peripheral wall portion, then foreign matters can be removed, but the cleaning liquid may mix with residual processing liquids causing contamination
Solution Approach 1:
Instead of trying to prevent cleaning liquid from contacting residual processing liquids, the invention inverts the approach by using the cleaning liquid flow to actively flush out and remove residual processing liquids from the peripheral wall portion before they can react
Solution Approach 2:
The invention performs preliminary cleaning action by supplying cleaning liquid to the recovery portion before foreign matters can form from the reaction of residual processing liquids, preventing the harmful effect rather than treating it after occurrence
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus efficiently removes foreign matters from the peripheral wall portions, preventing contamination and ensuring continuous, reliable substrate processing operations by utilizing a cleaning liquid that dissolves and removes crystals, and the heat exchange further enhances the cleaning process.
Implementation Method 1
utilizing a cleaning liquid that dissolves and removes crystals
Implementation Method 2
incorporating a heat exchange unit to enhance cleaning efficacy
Data Source
AI summary
Disclosed is a substrate processing apparatus including: a holding unit configured to hold a substrate; a processing liquid supply unit configured to supply a first processing liquid and a second processing liquid to the substrate; a first cup configured to recover the first processing liquid; a second cup disposed adjacent to the first cup and configured to recover the second processing liquid; a recovery portion defined by a peripheral wall portion that is erected on a bottom portion of the first cup; and a cleaning liquid supply unit configured to supply a cleaning liquid to the recovery portion. The peripheral wall portion is cleaned by causing the cleaning liquid supplied by the cleaning liquid supply unit to overflow from the peripheral wall portion to the second cup side.