Substrate Processing Cup Layout for Lower Chemical Liquid Use
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Solution Overview
Problem
Single substrate processing type substrate processing apparatuses face challenges in reducing the consumption of processing liquid, especially during lengthy processing due to continuous supply, necessitating further improvements.
Innovation Solution
A substrate processing apparatus with a processing block and a transfer block, featuring a transfer device, upper substrate holding portions, moving and raising/lowering mechanisms, and processing cup portions that allow for efficient transfer and processing of substrates with minimal liquid usage, including rinse and drying processes to reduce liquid consumption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Duration of action of stationary object
If continuous supply of processing liquid is used in single substrate processing type apparatus, then processing can be maintained for lengthy periods, but consumption amount of processing liquid cannot be reduced much
Solution Approach 1:
The apparatus employs periodic action by intermittently supplying processing liquid to the substrate rather than continuous supply. The liquid supply is activated only when the substrate is in the processing cup portion, and stopped when the substrate is transferred to the drying cup portion, thereby reducing overall liquid consumption while maintaining processing capability for lengthy operations
Solution Approach 2:
The processing chamber is segmented into multiple cup portions (processing cup portions and drying cup portions) arranged in sequence. The substrate is transferred through these segmented sections, with processing liquid supplied only in specific segments (processing cups) and not in others (drying cups), enabling reduced liquid consumption while maintaining prolonged processing capability
2Volume of moving object
If single substrate processing type apparatus is used, then apparatus size can be downsized compared to batch type, but processing liquid consumption cannot be reduced sufficiently for lengthy processing
Solution Approach 1:
The apparatus uses periodic liquid supply activated only during substrate processing in processing cup portions, and deactivated during transfer and drying phases, reducing overall liquid consumption while maintaining compact single-substrate processing capability
Solution Approach 2:
The apparatus introduces a temporal dimension to liquid supply control by activating supply only when needed (when substrate is in processing cups) and deactivating when not needed (during transfer and drying), transforming the continuous supply approach into an intermittent one, thereby reducing consumption without increasing apparatus size
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively reduces processing liquid consumption by optimizing substrate processing through sequential use of processing cup portions and controlled liquid application, enhancing efficiency and minimizing waste.
Implementation Method 1
The moving mechanism moves the upper substrate holding portion in a first direction that is a direction parallel to a direction in which the substrate moves between the transfer block and the processing block
Implementation Method 2
The raising/lowering mechanism raises and lowers at least one of the upper substrate holding portion and the corresponding processing cup portion such that a position of the substrate held by the upper substrate holding portion changes from one of over positions of the plurality of processing cup portions to a position inside the corresponding processing cup portion
Implementation Method 3
The first processing cup portion holds a processing liquid in contact with the substrate located inside the first processing cup portion and processes the substrate
Implementation Method 4
The draining portion drains the chemical liquid from the first processing cup portion
Implementation Method 5
The upper nozzle portion discharges a rinse liquid toward the substrate. The upper nozzle portion discharges the rinse liquid toward the substrate located inside the first processing cup portion from which the chemical liquid has been drained by the draining portion
Implementation Method 6
The upper rotating portion rotates the substrate integrally with the upper holding portion. After the discharge of the rinse liquid is stopped, the upper rotating portion rotates the substrate located inside the first processing cup portion and dry the substrate
Data Source
AI summary
A substrate processing apparatus includes a processing block and a transfer block. The processing block has an upper substrate holding portion, a moving mechanism, a processing cup row, and a raising/lowering mechanism. The upper substrate holding portion horizontally holds the substrate. The moving mechanism moves the upper substrate holding portion in a first direction that is a direction parallel to a direction in which the substrate moves between the transfer block and the processing block. The processing cup row includes a plurality of processing cup portions arranged in the first direction. The raising/lowering mechanism raises and lowers at least one of the upper substrate holding portion and the processing cup portion. The plurality of processing cup portions include a first processing cup portion. The first processing cup portion holds a processing liquid in contact with the substrate located inside the first processing cup portion and processes the substrate.