Substrate Deforming Device for Proximity Exposure Mask Deflection
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Solution Overview
Problem
Conventional proximity-type exposure techniques face limitations in maintaining patterning resolution due to deflection of large-area masks caused by their weight, leading to deviations in separation distance and reduced uniformity of the gap between the mask and substrate, which complicates direct control of the mask's deflection.
Innovation Solution
A substrate deforming device for proximity exposure, comprising a mask holder, a first plate identical to the mask material, position adjustment parts, gap adjustment parts, and sensors for precise control of the gap and substrate deformation to maintain a constant gap and improve patterning resolution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a large-area mask is used for proximity exposure, then productivity and cost advantages are achieved, but mask deflection due to weight causes gap non-uniformity and reduced patterning resolution
Solution Approach 1:
The substrate is pre-deformed in the opposite direction to the expected mask deflection before exposure. This preliminary action compensates for the gap non-uniformity that will occur during exposure, ensuring that the gap remains constant even when the mask deflects under its own weight
Solution Approach 2:
The physical shape of the substrate is changed by applying external forces through support structures positioned at specific locations. This changes the substrate's curvature to counteract the mask deflection, maintaining a constant gap between the mask and substrate across the exposure area
2Reliability
If the separation distance between mask and substrate is increased to avoid contact damage, then contact damage is prevented, but patterning resolution decreases due to diffraction
Solution Approach 1:
The substrate is made dynamically adjustable through support structures that can be positioned and adjusted to compensate for mask deflection. This dynamic adjustment allows maintaining a small, optimal gap distance while preventing contact damage, as the substrate can adapt its shape during the exposure process
3Manufacturing precision
If the weight of the exposure mask is reduced to minimize deflection, then mask deflection is decreased, but mask strength and structural integrity are compromised
Solution Approach 1:
An intermediary system consisting of support structures and control mechanisms is introduced between the mask and substrate. This intermediary compensates for mask deflection by actively adjusting the substrate position or shape, allowing the use of lighter masks without compromising gap uniformity or patterning resolution
Data Source
AI summary
Provided is a substrate deforming device for proximity exposure, the device comprising: a mask holder for holding an exposure mask; a first plate which is spaced apart from the exposure mask in a certain direction, and holds a to-be-exposed substrate; a position adjustment part for adjusting the position of the exposure mask; a gap adjustment part for adjusting a gap between the exposure mask and the to-be-exposed substrate; a first sensor for measuring the position of at least one among the exposure mask and the to-be-exposed substrate; a second sensor for measuring the gap between the exposure mask and the to-be-exposed substrate; and a control unit which performs a first control according to the measurement result from the first sensor, and after the first control, performs a second control according to the measurement result from the second sensor. The first control reduces the relative distance between the exposure mask and the to-be-exposed substrate by means of the position adjustment part. The second control deforms the to-be-exposed substrate by means of the gap adjustment part in response to deflection of the exposure mask.