Substrate Processing Apparatus Diagonal Correction Axes
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Solution Overview
Problem
Current lithographic processes face limitations in fully correcting overlay and critical dimension errors due to the restrictive correction capabilities of existing devices, which are primarily aligned along the X and Y axes, making it difficult to correct errors along directions other than parallel to these axes.
Innovation Solution
A substrate processing apparatus with corrective elements arranged along axes other than the traditional X and Y axes, allowing for local correction of process characteristics by orienting the substrate relative to a grid of corrective elements at a predetermined angle, enabling more comprehensive correction of features across the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If corrective elements are arranged only along X and Y axes, then device complexity is reduced, but manufacturing precision deteriorates because errors along other directions cannot be corrected
Solution Approach 1:
The patent applies dimensionality change by introducing a diagonal correction axis at 45 degrees relative to the traditional X and Y axes. This allows the corrective elements to correct errors along directions that were previously uncorrectable with axis-aligned elements alone, thereby improving manufacturing precision without requiring a full two-dimensional array of corrective elements
2Manufacturing precision
If corrective elements are arranged along multiple axes including diagonal axes, then manufacturing precision improves, but device complexity increases
Solution Approach 1:
The correction system is segmented into distinct axial components: X-axis corrective elements, Y-axis corrective elements, and diagonal-axis corrective elements. Each segment handles corrections along its specific direction, allowing the system to achieve comprehensive coverage while maintaining modular simplicity in each segment's design and operation
3Adaptability or versatility
If traditional X-Y axis corrective elements are used, then ease of manufacture is improved, but adaptability deteriorates because non-axis-aligned errors cannot be corrected
Solution Approach 1:
The patent introduces asymmetry by adding diagonal-axis corrective elements at 45 degrees to the traditional symmetric X-Y axis arrangement. This asymmetric configuration expands the system's adaptability to handle errors in any direction on the substrate, while the manufacturing process remains relatively simple by using the same basic corrective element design, just oriented at different angles
Data Source
AI summary
A substrate processing apparatus includes a substrate loading device configured to load a substrate in a predetermined orientation relative to a grid, having a X-axis and an orthogonal Y-axis, associated with a layout of fields on the substrate; and corrective elements configured to enable local correction of a characteristic of a process performed on a substrate, wherein the corrective elements are arranged along at least one axis having a direction other than parallel to the X-axis or the Y-axis of the grid.