Substrate Processing Disk Layout for Uniform Gas Distribution
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Solution Overview
Problem
Existing substrate processing apparatuses face challenges in achieving uniformity of processing processes due to empty spaces in center regions, leading to variations in process results between inner and outer portions of substrates.
Innovation Solution
A substrate processing apparatus with a supporting part, disk, lid, distribution unit, and purge unit, featuring a first protrusion portion that protrudes from the disk to reduce the size of empty spaces in center and gap regions, enhancing gas distribution and exhaust efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the amount of purge gas distributed to the center region is increased to prevent process gas diffusion, then process gas mixing is reduced, but the process gas is pushed outward causing non-uniform processing
Solution Approach 1:
The center region is segmented into multiple independent gas distribution zones using separate nozzles for process gas and purge gas. This allows independent control of each gas stream, preventing the pushing effect while maintaining prevention of gas mixing between processing regions.
Solution Approach 2:
Different gas distribution characteristics are applied to different locations within the center region. Process gas nozzles are positioned and oriented to provide localized gas supply only where needed, while purge gas nozzles are strategically placed to prevent mixing without creating outward push effects on the process gas.
2Manufacturing precision
If the amount of purge gas distributed to the center region is decreased to allow process gas distribution, then process gas diffuses to the center region, but different process gases mix causing non-uniform processing
Solution Approach 1:
The center region is divided into separate functional zones with dedicated nozzles for process gas and purge gas. This segmentation allows each gas type to be distributed independently to specific locations, ensuring process gas reaches processing regions while purge gas prevents mixing without causing diffusion issues.
Solution Approach 2:
The purge gas acts as an intermediary barrier between different process gas streams. By introducing purge gas at specific locations and orientations, it creates a protective interface that prevents mixing of different process gases without allowing process gas to diffuse into the center region.
3Manufacturing precision
If empty spaces in the center region are reduced by adding structural components, then gas distribution uniformity is improved, but device complexity increases
Solution Approach 1:
The disk structure serves multiple functions: it supports the substrates, provides mounting for gas distribution nozzles, and acts as a structural element to reduce empty space. The integrated design combines support and gas distribution functions into a single component, avoiding additional complex structures.
Solution Approach 2:
Gas distribution nozzles are strategically positioned only in specific locations where gas flow control is needed, rather than uniformly across the entire disk. This localized approach fills empty spaces functionally without adding unnecessary structural complexity to regions where it is not required.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design improves the uniformity of processing processes by reducing gas deviation and operating costs, while preventing gas mixing and residual gas penetration into substrates.
Implementation Method 1
the process gas distributed to the processing regions PA1 and PA2 by the distribution unit 12 is diffused to the center region CA
Implementation Method 2
the process gas diffused to the center region CA stays in the center region CA and then is pushed in the outward direction by the purge gas and a centrifugal force which acts based on a rotation of the disk 11
Data Source
AI summary
The present inventive concept relates to a substrate processing apparatus including a supporting part for supporting a substrate; a disk supporting a plurality of the supporting parts; a lid disposed on the disk; and a first protrusion portion coupled to the disk to protrude in an upward direction from the disk to the lid in a center region disposed inward from the supporting parts and a gap region disposed between the supporting parts.