Substrate Drying Unit for Liquid Immersion Exposure
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Solution Overview
Problem
Conventional substrate processing apparatuses face operational troubles and processing defects due to liquid adherence and contamination after exposure processing, which can lead to electrical system abnormalities and pattern deformation.
Innovation Solution
A substrate processing apparatus with a drying unit that uses inert gas to dry substrates after exposure, combined with a transport mechanism to prevent liquid dropout and contamination, and a cleaning method employing a fluid nozzle for efficient contaminant removal.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a liquid immersion method is used in the exposure device to achieve finer exposure patterns, then the manufacturing precision is improved, but the substrate becomes contaminated with liquid and eluate, causing operational troubles and processing defects
Solution Approach 1:
The patent extracts and removes the harmful liquid and eluate from the substrate surface using a dedicated removal unit positioned in the transport path between the exposure device and subsequent processing blocks. This separates the beneficial exposure function from the harmful contamination effect.
Solution Approach 2:
The patent introduces an intermediary removal unit that acts as a mediator between the exposure device and subsequent processing blocks. This unit captures and removes liquid and eluate before they can cause contamination in other blocks, preventing operational troubles while maintaining the liquid immersion exposure benefit.
2Productivity
If the substrate is transported directly from the exposure device to subsequent processing blocks, then the productivity is maintained, but the liquid adhering to the substrate causes operational troubles in other blocks
Solution Approach 1:
The patent applies preliminary action by removing liquid and eluate from the substrate surface immediately after exposure, before the substrate enters subsequent processing blocks. The removal unit is positioned in the transport path to perform this cleaning action proactively, preventing contamination before it can cause operational troubles.
Solution Approach 2:
The patent implements a rapid removal mechanism that quickly eliminates liquid and eluate from the substrate surface during transport. This rushing through the contamination problem maintains transport efficiency while preventing reliability issues in subsequent blocks.
3Device complexity
If conventional exposure devices are used with reduction projection, then the device complexity is reduced, but the manufacturing precision cannot achieve finer resist patterns
Solution Approach 1:
The patent introduces a liquid immersion environment as an intermediary medium between the projection optical system and the substrate. This liquid medium reduces the wavelength of exposure light, enabling finer resolution patterns without requiring a complete redesign of the projection system architecture.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents operational troubles by ensuring substrates are dry before further processing, reducing contamination risks, and maintaining pattern accuracy by effectively removing contaminants and preventing chemical influence on films.
Implementation Method 1
a drying unit configured to dry the substrate
Implementation Method 2
uses inert gas to dry substrates after exposure
Data Source
AI summary
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a drying/development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The drying/development processing block comprises a drying processing group. The interface block comprises an interface transport mechanism. A substrate is subjected to exposure processing by the exposure device, and subsequently transported to the drying processing group by the interface transport mechanism. The substrate is cleaned and dried by the drying processing group.