Substrate Drying Fluid Circulation With Solvent Condensation Reuse

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Solution Overview

Problem

Existing substrate processing methods consume high amounts of treatment solutions and drying fluids, with inefficiencies in separating these fluids, leading to wastage and potential re-contamination of substrates.

Innovation Solution

A substrate processing apparatus and method that incorporate a fluid circulation unit with a separator to efficiently separate treatment solutions and drying fluids from a mixed fluid, allowing for the reuse of treatment solutions and the recycling of drying fluids.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-affected harmful factors

If drying gas is continuously supplied to the process chamber to reduce organic solvent concentration, then substrate re-contamination is prevented, but drying gas consumption increases significantly

Engineering Contradiction:
Improvesubstrate re-contaminationVSAvoiddrying gas consumption
Core Design Contradiction:
Object-affected harmful factorsVSLoss of substance

Solution Approach 1:

The invention extracts and removes organic solvents from the process chamber atmosphere using a condenser that condenses the solvents from the gas phase. This allows the drying gas to be reused without continuous supply, resolving the contradiction between preventing re-contamination and reducing gas consumption.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The invention recovers the drying gas after it has served its purpose by condensing out the organic solvents. The recovered drying gas is then reused in subsequent drying cycles, eliminating the need for continuous supply while maintaining substrate protection against re-contamination.

Inventive Principle:
Principle #34Discarding and recovering

2Loss of substance

If treatment solution and drying fluid are separated from mixed fluid, then fluid reuse and recycling become possible, but system complexity increases due to separation equipment

Engineering Contradiction:
Improvetreatment solution and drying fluid wastageVSAvoidseparation equipment
Core Design Contradiction:
Loss of substanceVSDevice complexity

Solution Approach 1:

The invention uses phase transition (condensation) to separate organic solvents from the drying gas. The condenser transforms the solvent vapor into liquid form, enabling easy separation and reuse of both the drying gas and treatment solution without complex separation equipment.

Inventive Principle:
Principle #36Phase transitions

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The proposed solution minimizes the consumption and wastage of treatment solutions and drying fluids, effectively recycles these fluids, and reduces the risk of substrate re-contamination.

Implementation Method 1

a separator for separating the treatment fluid and the drying fluid from a mixed fluid in which the treatment fluid and the drying fluid exhausted from the processing space are mixed

Methodology Applied
Scientific EffectCondensation: Condensation

Implementation Method 2

a supercritical drying process has been utilized in which the residual rinse solution on the substrate is replaced with an organic solvent, such as isopropyl alcohol (IPA), which has a low surface tension, by supplying the organic solvent on the substrate and the substrate is then supplied with supercritical drying gas (for example, carbon dioxide) to remove the residual organic solvent from the substrate

Methodology Applied
Scientific EffectSupercritical drying: Supercritical Drying

Implementation Method 3

Both the temperature and the pressure of the drying gas rise to the critical point or above, and the drying gas undergoes a phase change to the supercritical state

Methodology Applied
Scientific EffectPhase change: Phase Change

Data Source

PatentUS20250132172A1Substrate processing apparatus and substrate processing method
Publication Date: 2025.04.24 SYSTEM ENGINEERING MEGA SOLUTION CO LTD
  • US20250132172A1 patent drawing
  • US20250132172A1 patent drawing
  • US20250132172A1 patent drawing

AI summary

Disclosed is an apparatus for processing a substrate, the apparatus including: a body providing a processing space; a supply line for supplying a drying fluid that removes a treatment fluid on a substrate supported in the processing space; an exhaust line for exhausting an atmosphere of the processing space; and a fluid circulation unit connected with the exhaust line and the supply line, in which the fluid circulation unit includes: a separator for separating the treatment fluid and the drying fluid from a mixed fluid in which the treatment fluid and the drying fluid exhausted from the processing space are mixed; and a liquid reuse line connected to the separator, and for withdrawing, from the separator, the treatment fluid separated from the separator.