Substrate Edge Cleaning for Immersion Exposure Contamination
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Solution Overview
Problem
Conventional substrate processing apparatuses face challenges in preventing contamination at the edge of substrates during exposure processing, leading to defective dimensions and shapes of exposure patterns due to contaminants adhering to the substrate and being mixed with the liquid in immersion exposure methods.
Innovation Solution
A substrate processing apparatus with a processing section and interface unit that includes a cleaning device to rotate and position the substrate for precise edge cleaning, using a cleaning device with a rotation driving mechanism and position correction device to ensure uniform cleaning and prevent contamination, and optionally employing a two-fluid nozzle or ultrasonic nozzle for effective edge cleaning.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If immersion exposure method is used to achieve finer exposure patterns, then manufacturing precision is improved, but contamination risk increases due to liquid contact with substrate edges
Solution Approach 1:
The patent applies preliminary action by cleaning the substrate edge before immersion exposure processing. The cleaning unit removes contaminants from the substrate edge prior to the substrate contacting the liquid in the exposure device, preventing contamination while enabling the use of immersion exposure for finer patterns.
2Reliability
If substrate edge cleaning is added to prevent contamination, then reliability is improved, but device complexity increases
Solution Approach 1:
The patent merges the cleaning function with the existing substrate transport interface. The cleaning unit is integrated into the interface block that already handles substrate transfer between processing chambers and the exposure device, combining multiple functions in one location to minimize additional complexity.
Solution Approach 2:
The interface block is designed to serve multiple functions: substrate transport between chambers, substrate cleaning at the edge, and coordination with the exposure device. This multi-functionality reduces the need for separate dedicated cleaning equipment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively prevents contamination in the exposure device by reliably removing contaminants from the substrate edge, ensuring accurate and uniform cleaning, which prevents defective exposure patterns and maintains the substrate's cleanliness during exposure processing.
Implementation Method 1
a rotation driving mechanism that rotates the substrate held by the substrate holding device around an axis perpendicular to the substrate
Data Source
AI summary
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block in the substrate processing apparatus. The exposure device subjects a substrate to exposure processing by means of an immersion method. In the edge cleaning unit in the cleaning/drying processing block, a brush abuts against an end of the rotating substrate, so that the edge of the substrate before the exposure processing is cleaned. At this time, the position where the substrate is cleaned is corrected.