Substrate Peripheral-Edge Coating With Rear-Surface Contamination Control

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Solution Overview

Problem

Existing substrate processing methods struggle to form a coating film on the peripheral edge of a substrate while preventing it from forming on the rear surface, leading to inefficiencies and potential contamination.

Innovation Solution

A substrate processing apparatus and method that includes a substrate holder, first and second chemical liquid suppliers, and removing parts to control the application and removal of chemical liquids, ensuring the coating film is formed on the front and side surfaces without adhering to the rear surface.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If chemical liquid is supplied onto the peripheral edge of the substrate including the rear surface, then the coating film can be formed on the peripheral edge, but the coating film forms on the rear surface causing contamination

Engineering Contradiction:
Improvecoating film formation precisionVSAvoidrear surface contamination
Core Design Contradiction:
Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The patent applies preliminary action by first supplying a first chemical liquid to the peripheral edge including the rear surface, then removing it before supplying the second chemical liquid for coating film formation. This preliminary removal step prevents the coating film from forming on the rear surface while ensuring proper coating on the front peripheral edge.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent segments the chemical liquid supply process into two distinct stages: first supplying a first chemical liquid to the peripheral edge (including rear surface), then removing it, and finally supplying a second chemical liquid for coating film formation. This segmentation allows precise control over where the coating film forms.

Inventive Principle:
Principle #1Segmentation

2Manufacturing precision

If the first chemical liquid is supplied onto the substrate, then it can adhere to the front surface and side surface, but it cannot be completely removed leaving residues

Engineering Contradiction:
Improvecoating film formation precisionVSAvoidfirst chemical liquid residue
Core Design Contradiction:
Manufacturing precisionVSLoss of substance

Solution Approach 1:

The patent uses preliminary action by removing the first chemical liquid before supplying the second chemical liquid. This ensures that any residues from the first chemical liquid are removed, preventing interference with the subsequent coating film formation process.

Inventive Principle:
Principle #10Preliminary action

3Reliability

If the coating film is formed on the front surface and side surface, then the peripheral edge is protected, but the process complexity increases

Engineering Contradiction:
Improveperipheral edge protectionVSAvoidprocessing apparatus complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent segments the coating process into multiple steps with different chemical liquids applied at different stages. The first chemical liquid is supplied, then removed, then the second chemical liquid is supplied for coating film formation. This segmentation allows the system to achieve reliable peripheral edge protection while managing process complexity through structured multi-step operations.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Effectively forms a coating film on the peripheral edge of a substrate's front and side surfaces while preventing it from forming on the rear surface, enhancing process efficiency and reducing contamination.

Implementation Method 1

a first chemical liquid supplier configured to supply a first chemical liquid onto the peripheral edge of the substrate including a rear surface of the substrate

Methodology Applied
Scientific EffectAdhesion: Adhesive

Implementation Method 2

a partial removing part configured to remove, among the first chemical liquid supplied onto the substrate, the first chemical liquid adhering to at least a portion of the front surface and the side surface of the substrate

Methodology Applied
Scientific EffectRemoval:

Implementation Method 3

a second chemical liquid supplier configured to supply a second chemical liquid for forming the coating film onto the front surface and the side surface of the substrate

Methodology Applied
Scientific EffectDeposition: Deposition (physical)

Implementation Method 4

a first chemical liquid removing part configured to remove the first chemical liquid remaining on the substrate to which the second chemical liquid adheres

Methodology Applied
Scientific EffectRemoval:

Data Source

PatentUS12435427B2Substrate processing method and storage medium
Publication Date: 2025.10.07 TOKYO ELECTRON LTD
  • US12435427B2 patent drawing
  • US12435427B2 patent drawing
  • US12435427B2 patent drawing

AI summary

A substrate processing apparatus for forming a coating film on a peripheral edge portion including a peripheral edge of a front surface and a side surface of a substrate, includes: a substrate holder for rotatably holding the substrate; a first chemical liquid supplier for supplying a first chemical liquid onto the peripheral edge including a rear surface of the substrate; a partial removing part for removing the first chemical liquid adhering to at least a portion of the front and side surfaces; a second chemical liquid supplier for supplying a second chemical liquid for forming the coating film onto the front and side surfaces; a first chemical liquid removing part for removing the first chemical liquid remaining on the substrate to which the second chemical liquid adheres; and a controller for controlling the parts described above.