Substrate Edge Exposure Using Segmented Linear Units
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Solution Overview
Problem
The existing apparatus and method for exposing the edge of a substrate in flat display device manufacturing are inefficient due to long exposure times, increased process time caused by reciprocating and rotational movements, and unnecessary standby periods, which also result in a larger apparatus size.
Innovation Solution
The apparatus includes a loading unit, an edge exposure unit with separate long and short side exposure units, and a conveyer unit arranged in an in-line type, allowing for simultaneous exposure and movement of the substrate without rotation, reducing exposure time and apparatus size.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the substrate is exposed using reciprocating and rotational movements in the related art apparatus, then the edge of the substrate can be exposed, but the exposure time period and process time are significantly increased
Solution Approach 1:
The exposure unit is divided into separate long side exposure unit and short side exposure unit, each dedicated to exposing specific edges of the substrate. This segmentation eliminates the need for reciprocating and rotational movements, allowing simultaneous exposure of all edges in a single linear passage, thereby significantly reducing exposure time while maintaining edge exposure quality
Solution Approach 2:
Instead of moving the substrate back and forth or rotating it to expose different edges (traditional approach), the invention inverts the approach by having fixed exposure units positioned along the linear path that expose different edges simultaneously as the substrate passes through once. This eliminates unnecessary movements and reduces exposure time
2Manufacturing precision
If the substrate undergoes rotational movement to expose different edges, then all edges can be exposed, but the apparatus size increases
Solution Approach 1:
The exposure function is segmented into separate long side and short side exposure units positioned along the linear path. This eliminates the need for a large rotational mechanism while achieving comprehensive edge exposure through compact linear arrangement of exposure components
Solution Approach 2:
The invention transitions from a two-dimensional rotational exposure approach to a one-dimensional linear exposure approach. By arranging exposure units along the linear passage direction, the apparatus achieves comprehensive edge exposure with reduced spatial footprint and smaller apparatus size
3Ease of operation
If the apparatus includes standby periods for substrate loading and unloading, then the substrate can be properly positioned, but the overall process time increases
Solution Approach 1:
The in-line configuration allows the substrate to move continuously through loading, exposure, and unloading operations without standby periods. The robot arm loads the substrate onto the conveyer unit which then transports it directly through the exposure unit, maintaining continuous motion and eliminating idle time to improve productivity
Solution Approach 2:
The loading unit, conveyer unit, and exposure unit are merged into an integrated in-line system where substrate handling and exposure operations are combined in a continuous flow. This eliminates separate standby periods for positioning and enables seamless transition between operations, enhancing both ease of operation and productivity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration reduces the edge exposure process time, improves productivity, and minimizes the apparatus size by eliminating unnecessary standby periods and rotational movements, enhancing the efficiency of the substrate edge exposure process.
Implementation Method 1
The exposure process is to selectively expose the photoresist deposited on the substrate using a mask
Data Source
AI summary
An apparatus and method for exposing an edge of a substrate are disclosed, in which an exposure time period for exposing the edge of the substrate is reduced. The apparatus for exposing an edge of a substrate includes a loading unit loading the substrate, and an edge exposure unit exposing the edge of the substrate loaded by the loading unit using each of a long side exposure unit and a short side exposure unit. Therefore, since the edge of the substrate is exposed using each of the long side exposure unit and the short side exposure unit, it is possible to reduce the edge exposure time period, thereby improving productivity. In addition, since no rotation of the substrate is required, it is possible to reduce the size of the apparatus. Moreover, since the apparatus is provided in an in-line type, it is possible to easily draw the substrate using a conveyer.


