Substrate Edge Cleaning Before Immersion Exposure
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Solution Overview
Problem
Conventional substrate processing apparatuses face contamination issues due to contaminants on the substrate edges, leading to defective exposure patterns and lens contamination in exposure devices, especially with the liquid immersion method, where contaminants can mix with the immersion liquid and affect the exposure process.
Innovation Solution
A substrate processing apparatus with an edge-cleaning unit that cleans the substrate edges before exposure processing, using methods like brushes, two-fluid nozzles, or ultrasonic nozzles to remove contaminants, and a drying processing unit to prevent liquid adherence and particles, ensuring the substrate is clean and dry before exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the liquid immersion method is used for exposure processing, then finer exposure patterns can be achieved, but contaminants on the substrate edge mix with the immersion liquid and contaminate the exposure device lens
Solution Approach 1:
The patent applies preliminary cleaning action by providing a cleaning unit that cleans the substrate edge before the substrate enters the exposure device for liquid immersion exposure. This preliminary cleaning removes contaminants that would otherwise mix with the immersion liquid and contaminate the lens, while preserving the benefits of the liquid immersion method for achieving finer exposure patterns.
2Reliability
If film formation processing is applied to the substrate, then the substrate is prepared for exposure, but the substrate edge becomes contaminated with film components
Solution Approach 1:
The cleaning unit performs preliminary cleaning of the substrate edge after film formation processing and before exposure processing. This removes film components that have accumulated on the substrate edge during film formation, preventing subsequent lens contamination while maintaining the necessary film structures for reliable exposure processing.
Solution Approach 2:
The cleaning unit extracts and removes contaminant substances from the substrate edge. The cleaning unit is configured to selectively remove film components and other contaminants from the substrate edge region without affecting the film structures on the substrate surface that are necessary for exposure processing.
3Productivity
If the substrate edge is not cleaned, then the processing flow is simpler and faster, but the exposure device lens becomes contaminated causing defective patterns
Solution Approach 1:
The cleaning unit provides rapid preliminary cleaning of the substrate edge in a dedicated cleaning zone before exposure. This preliminary action removes contaminants efficiently, preventing lens contamination and defective patterns, while the overall processing flow maintains high productivity through continuous substrate transport and automated cleaning integration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents contamination of the exposure device and maintains the integrity of exposure patterns by ensuring the substrate edges are clean and free of contaminants, reducing defects and improving the accuracy of the exposure process.
Implementation Method 1
an edge-cleaning unit that cleans the substrate edges before exposure processing, using methods like brushes, two-fluid nozzles, or ultrasonic nozzles to remove contaminants
Implementation Method 2
a drying processing unit to prevent liquid adherence and particles, ensuring the substrate is clean and dry before exposure
Data Source
AI summary
A substrate processing apparatus comprises an indexer block, an edge-cleaning processing block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block and an interface block. An exposure device is arranged adjacent to the interface block of the substrate processing apparatus. In the exposure device, exposure processing is applied to a substrate by a liquid immersion method. In the edge-cleaning processing group in the edge-cleaning processing block, an edge of the substrate before exposure processing is cleaned.