Substrate Edge Cleaning With Polymer Film Contamination Shielding
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Solution Overview
Problem
Existing substrate processing methods face contamination issues as chemical liquids or rinse liquids can splash back and attach to inner regions of the substrate, contaminating the upper surface beyond the bevel portion during cleaning.
Innovation Solution
A substrate processing method involving the formation of a polymer film to expose the peripheral edge region while covering the inner side region, followed by the use of specific cleaning and removing liquids to prevent contamination, including photo-exposure and precise removal techniques to demarcate and remove the polymer film effectively.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If chemical liquid is supplied to clean the peripheral edge region, then cleaning effect is improved, but contamination of inner side region occurs due to liquid splash back
Solution Approach 1:
The substrate surface is divided into peripheral edge region and inner side region, with different polymer film conditions applied to each. The peripheral edge region has removed polymer film to allow cleaning liquid access, while the inner side region maintains polymer film coverage to prevent contamination.
Solution Approach 2:
The polymer film serves as an intermediary protective layer between the cleaning liquid and the inner side region of the substrate. It allows the cleaning liquid to effectively clean the peripheral edge region while blocking contamination from reaching the inner side region.
2Object-affected harmful factors
If polymer film is formed to cover inner side region, then protection from contamination is improved, but removal of polymer film becomes more difficult
Solution Approach 1:
Different regions of the substrate have different polymer film states: the peripheral edge region has removed polymer film to allow cleaning, while the inner side region maintains intact polymer film for protection. This local differentiation enables both cleaning effectiveness and contamination prevention.
Solution Approach 2:
The polymer film is preliminarily formed across the entire substrate surface before cleaning, providing universal protection. Then selectively removed from the peripheral edge region to enable cleaning while maintaining protection over the inner side region.
3Manufacturing precision
If removing liquid is supplied to remove polymer film, then polymer film removal is improved, but contamination risk increases due to liquid spread
Solution Approach 1:
The removing liquid is applied locally to the peripheral edge region where polymer film needs removal, rather than across the entire substrate. This localized application ensures precise polymer film removal while preventing the removing liquid from spreading to and contaminating the inner side region.
Solution Approach 2:
The polymer film is extracted selectively from the peripheral edge region while remaining intact on the inner side region. This selective extraction allows the removing liquid to work only where needed without exposing the protected inner side region to contamination risks.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method effectively cleans the peripheral edge region while preventing contamination of the inner side region, ensuring precise removal of the polymer film and maintaining the substrate's cleanliness.
Implementation Method 1
a removing liquid supplying step of supplying, after the first cleaning liquid supplying step, a removing liquid that dissolves the polymer film more easily than the first cleaning liquid to the first principal surface
Implementation Method 2
the peripheral edge exposing step includes a photo-exposing step of photo-exposing (more specifically, selectively photo-exposing) the peripheral edge covering portion
Data Source
AI summary
A substrate processing method for processing a substrate having a first principal surface and a second principal surface at an opposite side to the first principal surface is provided. A polymer film is formed such as to expose a peripheral edge region of the first principal surface and cover an inner side region of the first principal surface positioned further to an inner side than the peripheral edge region and being adjacent to the peripheral edge region (polymer film forming step). After the polymer film forming step, a first cleaning liquid is supplied to the first principal surface such that the polymer film is maintained on the first principal surface (first cleaning liquid supplying step). After the first cleaning liquid supplying step, a removing liquid that dissolves the polymer film more easily than the first cleaning liquid is supplied to the first principal surface (removing liquid supplying step).