Swingable Substrate Edge Support for Low-Dust Cleaning

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Solution Overview

Problem

Conventional substrate cleaning devices face challenges in effectively cleaning the peripheral edge of substrates without causing dust generation or losing grip, due to the limitations of chuck arm designs that either fail to clean the edges or result in wear and unexpected dust when cleaning members interact with the chuck arm.

Innovation Solution

A substrate support mechanism that differentially supports the back and front surfaces of the substrate, using a first support part with a contact region for the peripheral edge and a second support part for the opposite surface, with magnetic forces enabling the first support part to swing and maintain contact without protruding excessively, allowing for effective cleaning of the substrate's edges while minimizing dust generation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the pencil cleaning member is swung to the outside of the peripheral edge of the substrate to clean the peripheral edge portion, then the cleaning effectiveness is improved, but the pencil cleaning member may come off or the chuck arm may lose grip of the substrate

Engineering Contradiction:
Improvecleaning effectivenessVSAvoidgrip stability
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The support mechanism is divided into a chuck arm for holding the substrate and a separate first support part for supporting the peripheral edge. This segmentation allows the cleaning member to access the peripheral edge through the gap between the first support part and substrate without compromising the chuck arm's grip stability.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The first support part acts as an intermediary structure that provides additional support to the peripheral edge region during cleaning operations. It mediates between the cleaning member and the substrate, enabling effective cleaning while preventing the chuck arm from losing grip.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If the roll cleaning member comes into contact with the tip portion of the chuck arm, then the cleaning coverage is improved, but the roll cleaning member is likely to be worn and may cause unexpected dust generation

Engineering Contradiction:
Improvecleaning coverageVSAvoiddust generation
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The support function is segmented from the cleaning function. The chuck arm and first support part provide structural support while the cleaning members (pencil and roll cleaning members) operate independently without contacting the chuck arm, eliminating wear and dust generation from contact between cleaning members and support structures.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The first support part is extracted as a separate functional element from the chuck arm. This allows the cleaning members to operate in a dedicated cleaning zone without interfering with or being damaged by the support structure, thus preventing dust generation from wear.

Inventive Principle:
Principle #2Taking out (Extraction)

3Reliability

If the tip portion of the chuck arm protrudes toward the front surface side with a relatively long length to support the substrate, then the substrate holding capability is improved, but the peripheral edge portion of the substrate cannot be cleaned by the pencil cleaning member

Engineering Contradiction:
Improvesubstrate holding capabilityVSAvoidcleaning accessibility
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The support function is divided between the chuck arm (which maintains substrate holding capability) and the first support part (which enables cleaning accessibility). The first support part can be positioned to allow the pencil cleaning member to reach the peripheral edge without compromising the chuck arm's substrate holding capability.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The first support part extends in a direction that creates a gap between itself and the substrate surface, providing a third-dimensional pathway for the pencil cleaning member to access the peripheral edge region without interfering with the chuck arm's vertical support function.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution ensures reliable cleaning of the substrate's peripheral edges while preventing dust generation and extending the service life of cleaning members by reducing wear and maintaining a stable grip on the substrate, even with reduced protrusion of the support mechanism.

Implementation Method 1

A first magnet may be provided in the first extending portion. A second magnet may be provided between the substrate and the first extending portion at a position facing the first magnet. A swinging force may be applied toward an inner side of a peripheral edge of the contact region by a repulsive force between the first magnet and the second magnet.

Methodology Applied
Scientific EffectMagnetic repulsion force: Ion Repulsion/Attraction

Data Source

PatentUS11948827B2Substrate support mechanism, substrate cleaning device and substrate processing method
Publication Date: 2024.04.02 EBARA CORP
  • US11948827B2 patent drawing
  • US11948827B2 patent drawing
  • US11948827B2 patent drawing

AI summary

The disclosure provides one technique for suppressing wear of a cleaning member and unexpected dust generation. A substrate support mechanism 100 includes a first support part 110 which is swingable and has a contact region that can come into contact with a peripheral edge of one surface of a substrate W in a closed state, a second support part 120 which supports the other surface of the substrate W, and a first support part moving part 140 which swings the first support part 110.