Substrate Edge Treatment via Vision Feedback
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Solution Overview
Problem
Existing substrate treating apparatuses face challenges in uniformly treating the edge region of rotating substrates due to misalignment and distortion of support plates, leading to inconsistent film removal widths and complexities in apparatus design.
Innovation Solution
A substrate treating apparatus with a rotatable support plate, a photographing member to capture images of the substrate, an edge treating unit that includes a light irradiating member, and a controller to adjust the relative position of the edge treating unit based on the substrate's rotation angle, ensuring uniform light irradiation and liquid dispensing across the substrate's edge region.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If alignment members are used to position the substrate on the support plate, then the substrate can be aligned to the correct position, but the apparatus structure becomes complex
Solution Approach 1:
The patent removes the alignment members from the apparatus structure and replaces them with a vision system that detects substrate position through imaging. The controller then adjusts the support plate rotation based on detected position deviations, eliminating the need for physical alignment members and simplifying the apparatus structure while maintaining alignment precision
Solution Approach 2:
The patent replaces the mechanical alignment members with an optical vision system and electronic control system. The photographing member captures substrate position, and the controller processes this information to adjust the support plate rotation, substituting mechanical alignment with an optical-electronic system that reduces structural complexity
2Reliability
If vacuum pressure is applied to clamp the substrate to the support plate, then the substrate is secured, but the substrate may be offset from the correct position
Solution Approach 1:
The patent applies vacuum pressure to clamp the substrate to the support plate before the light treatment process begins. This preliminary clamping action secures the substrate in place, preventing movement during subsequent treatment operations while the vision system and controller manage position adjustments
Solution Approach 2:
The patent uses the photographing member to detect substrate position and provides feedback to the controller. The controller then adjusts the support plate rotation angle based on detected position deviations, creating a closed-loop feedback system that maintains substrate position precision while the vacuum provides reliable clamping
3Duration of action of stationary object
If the support plate rotary shaft is used for a long period, then the apparatus operates continuously, but the rotary shaft may be distorted causing non-uniform treatment
Solution Approach 1:
The patent makes the support plate rotation angle dynamic and adjustable based on substrate position detection. Instead of relying on fixed mechanical precision that degrades over time, the system continuously adapts the rotation angle to compensate for distortions and maintain uniform edge treatment width throughout extended operation periods
Solution Approach 2:
The patent implements a feedback control system where the photographing member continuously monitors substrate position and the controller adjusts the support plate rotation angle accordingly. This feedback mechanism compensates for rotary shaft distortion that occurs during long-term operation, maintaining treatment uniformity without requiring perfect mechanical precision
4Productivity
If the substrate is rotated on the support plate, then the edge region can be treated, but the edge region may not be treated to a uniform width due to misalignment
Solution Approach 1:
The patent uses the photographing member to detect substrate position and provides feedback to the controller. The controller then adjusts the support plate rotation angle based on detected position deviations, ensuring that the edge region is treated to a uniform width even when the substrate is initially misaligned, thus maintaining both productivity and precision
Solution Approach 2:
The patent dynamically changes the support plate rotation angle parameter based on substrate position detection. By adjusting this parameter in response to detected misalignment, the system ensures uniform edge treatment width while maintaining efficient rotation-based treatment processes
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus ensures uniform treatment of the substrate's edge region, maintaining consistent film removal widths even when the substrate is offset or the support plate is misaligned, improving process efficiency and reducing apparatus complexity.
Implementation Method 1
an edge treating unit that treats an edge region of the substrate... The edge treating unit may be a light irradiating member that irradiates light... The light irradiating member may include a laser that irradiates a laser beam
Data Source
AI summary
The inventive concept relates to a substrate treating apparatus and method for removing various types of treating liquid or cleaning solution films on an edge region of a substrate without damage to a treated surface even though the substrate is rotated in an eccentric state.