Substrate Etching Control Using Stored Values During Sensor Failure
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing substrate processing apparatuses face challenges in maintaining stable substrate processing operations due to sensor abnormalities, which disrupt the control of etching and temperature processes, leading to inefficiencies and potential damage to substrates.
Innovation Solution
The substrate processing method and apparatus implement a control system that generates and stores records of recipe information and control value data, allowing for feedback and storage control strategies. When sensor abnormalities occur, the system switches to storage control based on pre-recorded control values, ensuring continuous and accurate processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If sensor-based feedback control is used to maintain substrate processing stability, then processing accuracy is improved, but system reliability deteriorates when sensor abnormalities occur
Solution Approach 1:
The system performs preliminary actions by storing control value information from normal processing operations before sensor failures occur. These stored values serve as backup control parameters that can be immediately deployed when sensor abnormalities are detected, ensuring continuous reliable operation without waiting for failure to occur
Solution Approach 2:
The system creates a copy of control value information from normal feedback control operations and stores it in a database. When sensor failures occur, this copied data serves as a reliable alternative, allowing the system to maintain substrate processing accuracy without depending on the failed sensor
2Manufacturing precision
If real-time sensor monitoring is implemented to detect abnormalities, then process control accuracy is improved, but response time deteriorates during sensor failures
Solution Approach 1:
Control value information is stored in advance during normal operations, creating a ready-to-use backup before sensor failures occur. This preliminary preparation eliminates the time delay that would otherwise be required to generate alternative control parameters during actual failures
Solution Approach 2:
The system continuously monitors sensor status and provides feedback on abnormality detection. When failures are detected, the feedback mechanism immediately triggers switching to pre-stored control values, minimizing response time through automated real-time decision-making
3Productivity
If feedback control based on sensor data is used to optimize substrate processing, then productivity is improved, but operational stability deteriorates when sensor abnormalities occur
Solution Approach 1:
The control system dynamically switches between feedback control mode (using real-time sensor data for high productivity) and storage control mode (using pre-stored control values for stability during failures). This dynamic adaptability allows the system to optimize for productivity when sensors are functional while maintaining stability when they fail
Solution Approach 2:
The system changes control parameters based on sensor status. During normal operation, it uses real-time sensor feedback parameters for optimized productivity. When sensor abnormalities are detected, it switches to using pre-stored control value parameters, maintaining operational stability through parameter transformation
Data Source
AI summary
A control device for a substrate processing apparatus stores a plurality of records each including a recipe for a substrate etching processing and a control value for a control target, the control value being an actual output value for the control target in the substrate etching processing; acquires a recipe at a start of the substrate etching processing when an abnormality occurs in the temperature sensor or in the concentration sensor; reads a record from among the plurality of records having a recipe identical to the recipe acquired at the start of the substrate etching processing; and executes the substrate etching processing based on the control value of the record read by the processor.


