Substrate Exhaust Cup Layout for Gas Separation and Uniform Pressure

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Solution Overview

Problem

Existing substrate processing apparatuses mix gases with different properties during exhaust, leading to particle accumulation and environmental pollution, and fail to maintain uniform pressure in exhaust ducts.

Innovation Solution

The apparatus features a cup unit with separate drain and exhaust baths, guide cups, and exhaust pipes to segregate and discharge gases and liquids, using guide plates to maintain uniform pressure in buffer spaces.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If gases are exhausted through one exhaust pipe, then the exhaust system is simple, but gages with various properties are mixed and exhausted causing particle accumulation and environmental pollution

Engineering Contradiction:
Improveexhaust system structureVSAvoidparticle accumulation and environmental pollution
Core Design Contradiction:
Device complexityVSObject-generated harmful factors

Solution Approach 1:

The exhaust system is divided into multiple separate exhaust pipes, each dedicated to exhausting a specific type of gas (sulfuric acid gas, alkaline gas, organic gas). This segmentation prevents mixing of different gases, thereby preventing particle accumulation from acid-base reactions and ensuring compliant separate discharge for environmental protection.

Inventive Principle:
Principle #1Segmentation

2Object-generated harmful factors

If multiple exhaust pipes are used to separately discharge gases, then environmental pollution is prevented, but the exhaust system becomes complex

Engineering Contradiction:
Improveenvironmental pollution preventionVSAvoidexhaust system structure
Core Design Contradiction:
Object-generated harmful factorsVSDevice complexity

Solution Approach 1:

The guide cup structure serves multiple functions: it guides treatment liquid to drain baths, defines exhaust passages, and supports the exhaust pipe assembly. This multi-functionality reduces the need for additional separate components, thereby limiting the increase in overall system complexity despite implementing multiple exhaust pipes.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Device complexity

If gases are mixed in exhaust, then exhaust path is simple, but particles produced by acid-base reaction accumulate and interfere with exhaust

Engineering Contradiction:
Improveexhaust path structureVSAvoidexhaust function
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The exhaust path is segmented into multiple independent channels, each handling a specific gas type. This prevents acid-base reactions between different gases (e.g., sulfuric acid gas and alkaline gas), eliminating particle accumulation and ensuring reliable exhaust function without compromising path simplicity.

Inventive Principle:
Principle #1Segmentation

4Device complexity

If uniform pressure is not maintained in exhaust ducts, then the system is simpler to construct, but exhaust efficiency decreases

Engineering Contradiction:
Improvepressure control mechanismVSAvoidexhaust efficiency
Core Design Contradiction:
Device complexityVSProductivity

Solution Approach 1:

The exhaust system incorporates local pressure control features at specific locations in the exhaust ducts. This targeted approach maintains uniform pressure where needed for efficient exhaust while avoiding the complexity of system-wide pressure control mechanisms.

Inventive Principle:
Principle #3Local quality

Data Source

PatentUS20250218816A1Apparatus of processing a substrate
Publication Date: 2025.07.03 SYSTEM ENGINEERING MEGA SOLUTION CO LTD
  • US20250218816A1 patent drawing
  • US20250218816A1 patent drawing
  • US20250218816A1 patent drawing

AI summary

The present invention relates to an apparatus of processing a substrate, in more detail, an apparatus of processing a substrate, the apparatus being able to separately discharge gas produced during substrate treatment. An object is to provide an apparatus of processing a substrate that can separately discharge gases simultaneously with treatment liquids and can provide uniform pressure in a plurality of exhaust baths.