Substrate Transport Exhaust Control for Particle Suppression
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Solution Overview
Problem
Current substrate transporting devices inadequately suppress floating particles, particularly at the end face of the transport chamber and through transportation ports, which can contaminate substrates and hinder high-quality treatment or transport.
Innovation Solution
A substrate transporting device with a transport mechanism movable in parallel, featuring a first exhaust unit disposed closer to a wall than transportation ports, which increases exhaust flow when approaching the wall to efficiently expel gas and prevent particle flow, maintaining positive pressure and reducing energy consumption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a conventional exhaust unit is used in the transport chamber, then gas can be exhausted, but floating particles cannot be effectively suppressed especially at the end face and through transportation ports
Solution Approach 1:
The exhaust function is segmented into multiple exhaust units positioned at different locations within the transport chamber. Specifically, exhaust units are placed at both end faces and side walls of the transport chamber, allowing localized particle suppression at each region where particles tend to accumulate or escape through transportation ports.
Solution Approach 2:
Different regions of the transport chamber are equipped with exhaust units based on their specific particle suppression needs. The end faces have exhaust units directed toward the transportation ports, while side walls have exhaust units positioned to cover areas with transportation ports. This local customization of exhaust capability ensures effective particle suppression at each critical location.
2Object-affected harmful factors
If exhaust flow is increased to suppress particles, then particle suppression improves, but energy consumption increases
Solution Approach 1:
The exhaust flow rate of each exhaust unit is dynamically adjusted based on the real-time position of the substrate during transportation. When the substrate approaches a transportation port, the exhaust flow rate is automatically increased to suppress particles at that location. When the substrate is away from transportation ports, the exhaust flow rate is reduced, minimizing energy consumption while maintaining particle suppression effectiveness.
Solution Approach 2:
The system incorporates position detection of the substrate and uses this information as feedback to control the exhaust flow rates. The controller receives position signals and adjusts the exhaust units accordingly, creating a closed-loop control system that optimizes energy consumption by activating exhaust only when and where particles need to be suppressed.
3Object-affected harmful factors
If multiple exhaust units are added to suppress particles at all locations, then particle suppression improves, but device complexity increases
Solution Approach 1:
The exhaust units are designed as independent, modular components that can be individually positioned and controlled. Each exhaust unit is extracted as a separate functional element with its own control mechanism, allowing flexible placement at critical locations without requiring a complex integrated system. This modular approach simplifies the overall device architecture while maintaining effective particle suppression.
Solution Approach 2:
Instead of providing uniform exhaust coverage throughout the entire transport chamber, exhaust units are strategically placed only at critical locations where particles tend to accumulate or escape, such as end faces and side walls with transportation ports. This partial action approach focuses exhaust resources on the most critical areas, reducing the total number of exhaust units needed while maintaining effective particle suppression.
4Device complexity
If exhaust units are positioned far from transportation ports, then device simplicity is maintained, but particle suppression at ports is insufficient
Solution Approach 1:
Exhaust units are positioned in close proximity to transportation ports at end faces and side walls, creating localized high-velocity exhaust flows precisely where particles need to be suppressed. This local positioning ensures that the exhaust force is applied directly at the critical interfaces where particles can escape, maximizing particle suppression effectiveness without requiring exhaustive coverage of the entire chamber.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively suppresses floating particles around transportation ports and within the transport chamber, preventing contamination and optimizing substrate protection and treatment quality while minimizing energy consumption.
Implementation Method 1
a first exhaust unit that is disposed closer to the first wall than any of the transportation ports and that exhausts gas in the transport chamber outside the transport chamber
Data Source
AI summary
Disclosed is a substrate transporting device including a transport mechanism, a transport chamber, a first exhaust fan, and a controller. The transport mechanism is movable in parallel in a given direction. The transport chamber includes a first wall disposed on a first side of the given direction of the transport mechanism, and a plurality of transportation ports each used for moving the substrate between an exterior and an interior of the transport chamber. The first exhaust fan is disposed closer to the first wall than any of the transportation ports, and exhausts gas in the transport chamber outside the transport chamber. The controller performs control such that, when the transport mechanism moves toward the first wall in a first proximal area whose distance from the first wall is of a given value or less, an exhaust amount of the first exhaust fan is larger than that when the transport mechanism moves toward the first wall out of the first proximal area.