Substrate Liquid Film Detection Before Supercritical Drying
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Solution Overview
Problem
Conventional substrate processing apparatuses often perform drying processes with improperly formed liquid films, leading to poor substrate yield due to inadequate detection and regulation of liquid film formation on substrates.
Innovation Solution
Incorporating a substrate processing apparatus with a liquid amount detecting part and a coating state detecting part to ensure the liquid film covers the substrate pattern within a predetermined range before performing the drying process, using supercritical fluids to remove the IPA liquid.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional drying process is performed without proper liquid film formation detection, then processing speed is maintained, but substrate yield deteriorates due to improper liquid film formation
Solution Approach 1:
The liquid film formation detection is performed before the drying process to ensure proper liquid film coverage. The coating state detecting part checks whether the liquid film covers the pattern, and the liquid amount detecting part verifies the liquid amount is within the predetermined range. This preliminary detection prevents improper drying and maintains substrate yield without significantly impacting processing speed.
2Reliability
If liquid film formation is detected and regulated before drying, then substrate yield is improved, but device complexity increases due to additional detection parts
Solution Approach 1:
The coating state detecting part and liquid amount detecting part are integrated into the substrate processing apparatus to perform multiple detection functions. The coating state detecting part determines whether the liquid film covers the pattern, while the liquid amount detecting part measures the liquid amount. These multi-functional detection capabilities are built into the existing apparatus structure to minimize additional complexity while improving substrate yield.
3Manufacturing precision
If liquid amount is detected and regulated within predetermined range, then pattern collapse is prevented, but measurement precision requirements increase
Solution Approach 1:
The liquid amount detecting part provides feedback on the liquid amount of the liquid film formed on the substrate. This feedback mechanism allows the system to determine whether the liquid amount is within the predetermined range and adjust the liquid film formation process accordingly. The feedback loop ensures pattern integrity by preventing both insufficient and excessive liquid amounts that could cause pattern collapse.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach improves substrate yield by accurately detecting and regulating the liquid film formation, preventing pattern collapse and particle generation during the drying process, thereby enhancing the quality and efficiency of the substrate processing.
Implementation Method 1
a liquid film formation preventing part configured to prevent pattern collapse by forming a liquid film on the substrate
Implementation Method 2
performs a drying process by bringing the substrate having the liquid film formed thereon into contact with a supercritical fluid
Data Source
AI summary
There is provided a substrate processing apparatus comprising a liquid amount detecting part configured to detect a liquid amount of a liquid film formed on a substrate; and a coating state detecting part configured to detect a coating state of the substrate with the liquid film formed thereon.