Substrate Liquid Film Solidification for Pattern Gap Cleaning

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Solution Overview

Problem

Current substrate cleaning processes face inefficiencies in removing particles from between patterns on a substrate due to uneven distribution and volatility of treating liquids, leading to incomplete cleaning and increased liquid usage.

Innovation Solution

A substrate treating method involving the discharge of a treating liquid with a polymer and solvent, followed by controlled rotation speeds and periods to solidify the liquid film, allowing it to spread between patterns and enhance cleaning efficiency, including stopping rotation or adjusting speeds to prevent liquid from exiting between patterns.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the substrate is rotated at high speed to volatilize the solvent and solidify the polymer, then the cleaning process can be completed, but the treating liquid may be directed to a specific area or exit out of the pattern area, reducing cleaning effectiveness

Engineering Contradiction:
Improvecleaning process completionVSAvoidtreating liquid distribution uniformity
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The substrate rotation is performed in multiple periods with different rotation speeds. A first period uses a first rotation speed for initial treating liquid distribution, and a second period uses a second rotation speed for solvent volatilization and polymer solidification. This periodic variation in rotation speed ensures both uniform distribution and effective cleaning without liquid exit.

Inventive Principle:
Principle #19Periodic action

2Manufacturing precision

If the treating liquid is supplied onto a rotating substrate to ensure even distribution, then the substrate can be cleaned, but the liquid may exit between patterns before solidification occurs

Engineering Contradiction:
Improvetreating liquid distribution uniformityVSAvoidliquid exit between patterns
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The substrate is rotated at a first rotation speed during the treating liquid supply period to ensure even distribution before the liquid can exit between patterns. This preliminary rotation action distributes the liquid uniformly across the substrate surface, preventing liquid exit while maintaining distribution uniformity.

Inventive Principle:
Principle #10Preliminary action

3Manufacturing precision

If the substrate is stopped during solvent volatilization to prevent liquid movement, then the polymer can solidify properly, but the processing time increases

Engineering Contradiction:
Improvepolymer solidification qualityVSAvoidsolidification time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The substrate rotation is performed in multiple periods with different rotation speeds. A first period uses a first rotation speed for initial treating liquid distribution, and a second period uses a second rotation speed for solvent volatilization and polymer solidification. This periodic variation in rotation speed ensures both uniform distribution and effective cleaning without liquid exit.

Inventive Principle:
Principle #19Periodic action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method increases cleaning efficiency, reduces the amount of cleaning liquid used, and effectively permeates between substrate patterns, ensuring thorough particle removal.

Implementation Method 1

solidifying a liquid film of the treating liquid by volatilizing the solvent from the treating liquid on the substrate

Methodology Applied
Scientific EffectEvaporation: Evaporation

Data Source

PatentUS20240416394A1Method for treating a substrate
Publication Date: 2024.12.19 SYSTEM ENGINEERING MEGA SOLUTION CO LTD
  • US20240416394A1 patent drawing
  • US20240416394A1 patent drawing
  • US20240416394A1 patent drawing

AI summary

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes discharging a treating liquid including a polymer and a solvent onto a substrate; and solidifying a liquid film of the treating liquid by volatilizing the solvent from the treating liquid on the substrate, and wherein the solidifying a liquid film comprises a first period of stopping the rotation of the substrate or rotating the substrate at a first speed for a first time period.