Substrate Cleaning with Solidified Film Stripping for Fine Particles

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing substrate cleaning processes are inefficient in removing fine particles and those deposited on the edge regions of patterns, leading to low removal efficiency and incomplete cleaning.

Innovation Solution

A substrate treating method involving a treatment liquid with a polymer and solvent, followed by a stripping liquid and rinse liquid, with controlled rotation speeds and liquid compositions to form and remove a solidified liquid film, ensuring thorough cleaning and penetration into patterned areas.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If conventional cleaning processes are used, then large particles are easily removed, but fine particles and particles on edge regions are not easily removed

Engineering Contradiction:
Improveparticle removal efficiencyVSAvoidcleaning completeness
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The invention changes the physical and chemical parameters of the cleaning liquid by adding polymers with specific molecular weights (1,000-1,000,000) and controlling concentrations (0.01-10%). This modifies the liquid's viscosity, surface tension, and wetting properties to enhance penetration into pattern edges and adhesion to fine particles, enabling effective removal of previously difficult-to-clean contaminants

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention uses composite cleaning liquids containing multiple components: polymers (such as PVA, PEG, PMMA), solvents (water, alcohol), and optionally surfactants. This composite formulation combines the advantages of each component to achieve both fine particle removal and edge region penetration while maintaining ease of manufacture

Inventive Principle:
Principle #40Composite materials

2Productivity

If treatment liquid with polymer and solvent is supplied to form solidified liquid film, then cleaning efficiency and penetration are enhanced, but process complexity increases

Engineering Contradiction:
Improvecleaning efficiencyVSAvoidprocess complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The invention implements a multi-stage periodic process: (1) supplying treatment liquid containing polymer and solvent, (2) forming solidified liquid film through controlled evaporation or cooling, (3) stripping the solidified film, and (4) rinsing with rinse liquid. This periodic sequence of distinct operations systematically addresses different cleaning requirements while maintaining process control

Inventive Principle:
Principle #19Periodic action

Solution Approach 2:

The treatment liquid is supplied and allowed to form a solidified liquid film before the actual stripping operation. This preliminary film formation step prepares the cleaning medium in an optimal state for particle adhesion and pattern penetration, making the subsequent stripping step more effective and simplifying overall process control

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method effectively removes particles from substrates, including those in patterned areas, by forming and stripping a solidified liquid film, enhancing cleaning efficiency and penetration, thereby improving the overall cleaning process.

Implementation Method 1

forming a solidified liquid film by volatilizing the solvent in the treatment liquid

Methodology Applied
Scientific EffectVolatilization: Evaporation

Data Source

PatentUS12159793B2Substrate treating apparatus and substrate treating method
Publication Date: 2024.12.03 SYSTEM ENGINEERING MEGA SOLUTION CO LTD
  • US12159793B2 patent drawing
  • US12159793B2 patent drawing
  • US12159793B2 patent drawing

AI summary

A substrate treating method including removing particles formed on a substrate by continuously performing a process of supplying a treatment liquid including a polymer and a solvent onto the substrate, forming a solidified liquid film by volatilizing the solvent in the treatment liquid, removing the solidified liquid film from the substrate by supplying a stripping liquid onto the substrate, and supplying a rinse liquid onto the substrate may be provided.