Substrate Fixing Device for Three-Side Deposition
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Solution Overview
Problem
Current deposition processing equipment is limited in its ability to perform cost-effective multi-side deposition on multiple substrates simultaneously, which hampers mass productivity and efficiency in manufacturing processes.
Innovation Solution
A substrate fixing device and deposition processing equipment with multiple chambers, where the substrate fixing device includes a first and second supporter to vertically fix substrates, allowing three-side deposition, and a transfer module to move substrates between chambers, enabling efficient exposure of the deposition surface to the processing space and use of a movable deposition source for material application.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional deposition equipment processes substrates one at a time or uses simple single-chamber designs, then device complexity is low, but productivity and mass production capability are limited
Solution Approach 1:
The deposition equipment is divided into multiple independent chambers (first chamber for loading, second chamber for deposition, third chamber for unloading) that can operate simultaneously or independently. Each chamber handles specific functions, allowing parallel processing and increasing productivity without requiring a single overly complex system.
Solution Approach 2:
The substrate fixing device serves multiple functions: it holds substrates in various orientations (0-degree and 45-degree), enables three-side deposition (front, rear, and side surfaces), and can process multiple substrates simultaneously. This multi-functionality increases productivity without proportionally increasing complexity.
2Productivity
If the substrate fixing device holds substrates in fixed orientations only, then device structure is simple, but deposition surface exposure and processing efficiency are limited
Solution Approach 1:
The substrate fixing device incorporates adjustable support members that can rotate substrates between 0-degree and 45-degree orientations. This dynamic adjustment allows the deposition source to access different surfaces (front, rear, side) of substrates, enabling three-side deposition and increasing processing efficiency without requiring a completely complex fixed structure.
Solution Approach 2:
The device adds rotational freedom in the angular dimension, allowing substrates to be oriented at multiple angles (0度和45度) rather than fixed in one position. This dimensional change enables exposure of multiple deposition surfaces simultaneously, improving efficiency while adding only moderate structural complexity through rotation mechanisms.
3Loss of substance
If only one side of the substrate is exposed for deposition, then device structure is simple, but material utilization and cost-effectiveness are reduced
Solution Approach 1:
The deposition source is positioned and configured to selectively deposit materials on specific local areas of the substrate based on its orientation. By adjusting the substrate angle (0 or 45 degrees), the system can target different surfaces (front surface, rear surface, or side surface) for deposition, optimizing material utilization on each side while maintaining manageable device complexity through localized deposition control.
Solution Approach 2:
The adjustable substrate orientation mechanism allows dynamic repositioning to expose different surfaces to the deposition source. This enables the system to process multiple sides of substrates (three-side deposition) by simply rotating them, improving material cost-effectiveness without requiring complex multi-source deposition hardware.
4Productivity
If multiple substrates are processed simultaneously, then productivity increases, but chamber space requirements and equipment complexity increase
Solution Approach 1:
Multiple substrates are consolidated onto a single substrate fixing device using shared support members, which then acts as one unit within the deposition chamber. This merging approach allows processing of multiple substrates simultaneously without requiring separate chambers for each substrate, thereby increasing productivity while minimizing the volume increase that would result from multiple independent processing units.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This setup allows for the simultaneous deposition on multiple substrates, reducing process time and material costs, thereby enhancing mass productivity by enabling large quantities of substrates to be processed efficiently.
Implementation Method 1
a deposition source that emits a deposition material deposited on the at least one substrate
Data Source
AI summary
A substrate fixing device includes a first supporter supporting at least one substrate and a second supporter connected to the first supporter, making contact with a first surface and a second surface of the at least one substrate in a first direction, and vertically fixing the at least one substrate such that a third surface faces a normal line direction of the first supporter. The second supporter defines a deposition surface including the third surface, a portion of the first surface adjacent to the third surface, and a portion of the second surface adjacent to the third surface in the at least one substrate and exposes the defined deposition surface to the deposition processing space. A deposition processing equipment including the substrate fixing device and a deposition processing method using the deposition processing equipment are also provided.