Substrate Processing Fluid Supply for Uniform Agitation
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Solution Overview
Problem
Existing substrate processing devices face challenges in efficiently processing substrates using phosphoric acid aqueous solutions due to air bubble generation issues, which affect the agitation and processing speed.
Innovation Solution
A substrate processing device with a fluid supply unit that includes multiple fluid supply units positioned symmetrically around the substrate, allowing for controlled fluid supply changes, including gas and liquid supply, to enhance agitation and processing efficiency by adjusting fluid supply positions and flow rates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If air bubbles are generated by spraying mixed gas into phosphoric acid aqueous solution for aeration agitation, then agitation is achieved, but processing uniformity deteriorates due to bubble generation biases
Solution Approach 1:
The fluid supply unit is divided into multiple supply ports arranged in different directions around the substrate. This segmentation allows uniform fluid supply from multiple angles, preventing the bias that occurs with single-direction gas spraying and achieving both effective agitation and uniform processing.
Solution Approach 2:
Different regions of the substrate receive fluid supply optimized for their specific location. The multiple supply ports are positioned to deliver fluid to different areas of the substrate, ensuring that each region receives appropriate agitation and processing conditions, thereby improving overall uniformity.
2Productivity
If fluid supply rate is increased to improve processing speed, then productivity increases, but agitation uniformity deteriorates due to excessive flow rates
Solution Approach 1:
The total fluid supply rate is segmented across multiple supply ports rather than concentrated in one location. This distribution allows the system to maintain higher overall flow rates for improved productivity while each individual port delivers fluid at a controlled rate that maintains agitation uniformity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The controlled fluid supply system improves substrate processing by maintaining uniform agitation and processing speed, reducing processing biases and enhancing the effectiveness of operations like etching and surface treatment.
Implementation Method 1
air bubbles are generated by spraying a mixed gas into the phosphoric acid aqueous solution such that the phosphoric acid aqueous solution is subjected to aeration agitation
Data Source
AI summary
A substrate processing device includes a processing tank, a substrate holding unit, a fluid supply unit, and a control unit. The processing tank stores a processing liquid for processing a substrate. The substrate holding unit holds the substrate in the processing liquid in the processing tank. The fluid supply unit supplies a fluid to the processing tank. The control unit controls the fluid supply unit. The control unit controls the fluid supply unit such that the fluid supply unit changes supply of the fluid during a period from a start of supply of the fluid to the processing tank storing the processing liquid in which the substrate is immersed to an end of supply of the fluid to the processing tank storing the processing liquid in which the substrate is immersed.