Substrate Processing Friction Body Zigzag Motion
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Solution Overview
Problem
Existing substrate processing technologies are inefficient in processing both the center and peripheral areas of a substrate surface, leading to prolonged processing times and potential particle generation due to inadequate movement and liquid application strategies.
Innovation Solution
A substrate processing apparatus with a holder, liquid supply, friction body, and controller that moves the friction body in a zigzag trajectory during chemical and rinsing liquid application, optimizing contact positions and reducing unnecessary operations by alternating movement directions between the first and second axial directions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If the friction body moves in a single direction during liquid supply, then the processing is simple to control, but the processing time is prolonged and particle generation increases
Solution Approach 1:
The friction body alternates movement direction periodically between positive and negative directions of the first axial direction during supply of different processing liquids. This periodic direction reversal enables efficient coverage of the substrate surface while maintaining simple control logic, resolving the contradiction between control simplicity and processing efficiency.
Solution Approach 2:
The movement direction of the friction body is dynamically adjusted based on the type of processing liquid being supplied. The controller changes the movement direction from positive to negative (or vice versa) when switching between first and second processing liquids, optimizing processing efficiency without complicating the overall control system.
2Device complexity
If the friction body remains stationary or moves minimally during liquid supply, then the liquid application is simple, but the center and peripheral areas are not effectively processed
Solution Approach 1:
The friction body performs periodic back-and-forth movements in the first axial direction during supply of different processing liquids. This periodic motion ensures that both the center area (when friction body is at central position) and peripheral areas (when friction body moves to peripheral positions) of the substrate are effectively contacted and processed.
Solution Approach 2:
The friction body's position is dynamically adjusted during processing by alternating its movement direction. This dynamic positioning ensures comprehensive coverage of the substrate surface including both center and peripheral regions, achieving effective cleaning without requiring complex multi-axis movement control.
3Device complexity
If processing liquids are supplied without alternating friction body movement direction, then the liquid supply process is simple, but chemical liquid drying occurs on the substrate
Solution Approach 1:
The friction body alternates movement direction in synchronization with the supply of different processing liquids. This periodic motion prevents chemical liquid from remaining stationary and drying on the substrate by ensuring continuous movement during the processing sequence, thereby maintaining reliability without complicating the processing sequence control.
Solution Approach 2:
The friction body's movement direction is dynamically changed between supply of first and second processing liquids. This dynamic adjustment ensures that the substrate surface is continuously processed and prevents drying of chemical liquids, achieving reliable processing results with simple sequential control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces processing time, minimizes particle generation, and effectively cleans both the center and peripheral areas of the substrate surface, enhancing processing efficiency and preventing chemical liquid drying on the substrate.
Implementation Method 1
a friction body (70) that comes into contact with and rubs a main surface of the substrate during supply of the first processing liquid and the second processing liquid
Implementation Method 2
a liquid supply (30) configured to sequentially supply a first processing liquid and a second processing liquid different from the first processing liquid, to a main surface of the substrate held by the holder
Data Source
AI summary
A substrate processing apparatus includes: a holder that holds a substrate; a liquid supply that sequentially supplies a first processing liquid and a second processing liquid to a main surface of the substrate held by the holder; a friction body that comes into contact with and rub the main surface of the substrate during the supply of the first processing liquid and the second processing liquid; a mover that moves a contact position of the friction body in a first axial direction and a second axial direction; and a controller that controls the liquid supply and the mover to move the contact position of the friction body in one-side direction of the first axial direction during the supply of the first processing liquid, and move the contact position of the friction body in the other-side direction of the first axial direction during the supply of the second processing liquid.