Substrate Processing Gap Washing via Inverted Discharge and Rotation
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing substrate processing methods fail to effectively wash the narrow cylindrical gaps between the outer circumferential surface of a body and the inner circumferential surface of an opposing member, leading to incomplete removal of contaminants.
Innovation Solution
A substrate processing apparatus and method that includes a washing liquid discharge port on the outer surface of the body, which discharges washing liquid into the cylindrical gap while rotating the opposing member and body relative to each other, creating a centrifugal and gravitational force to direct the washing liquid downward and remove contaminants.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If washing liquid is sprayed from below to cylindrical gaps, then the washing liquid can reach the gaps, but the narrow intervals between the gaps prevent the washing liquid from spreading satisfactorily across the cylindrical gaps
Solution Approach 1:
Instead of spraying washing liquid from below as in conventional methods, the invention discharges washing liquid from the outer circumferential surface of the body toward the inner circumferential surface of the opposing member. This inverted discharge direction enables the washing liquid to effectively reach and spread across the narrow cylindrical gaps, resolving the coverage problem caused by narrow gap intervals.
Solution Approach 2:
The invention introduces relative rotation between the body and opposing member as a new dimension of motion. By rotating these components while discharging washing liquid, the washing liquid spreads more effectively across the cylindrical gaps through the rotational motion, overcoming the limitation of narrow gap intervals and achieving satisfactory washing coverage.
2Reliability
If the cylindrical gaps are not thoroughly washed, then the apparatus structure remains simple, but contaminants remain on the inner and outer surfaces of the gaps
Solution Approach 1:
The invention makes the washing mechanism dynamic by introducing relative rotation between the body and opposing member during the washing process. This rotational motion dynamically enhances the spreading and penetration of washing liquid throughout the cylindrical gaps, ensuring thorough removal of contaminants from both inner and outer surfaces while maintaining a relatively simple apparatus structure.
Solution Approach 2:
The continuous relative rotation of the body and opposing member during washing ensures that the washing liquid continuously contacts all surfaces of the cylindrical gaps. This continuous action prevents contamination residue and achieves reliable cleaning effectiveness without requiring complex multi-stage washing mechanisms.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration ensures thorough washing of the cylindrical gaps by forming a swirling flow that effectively removes contaminants from both inner and outer surfaces, improving cleaning efficiency.
Implementation Method 1
discharges a washing liquid toward the inner circumferential surface... creating a centrifugal and gravitational force to direct the washing liquid downward
Implementation Method 2
discharges a washing liquid toward the inner circumferential surface... creating a centrifugal and gravitational force to direct the washing liquid downward
Implementation Method 3
relatively rotates the opposing member and the body... forming a swirling flow that effectively removes contaminants
Data Source
AI summary
A substrate processing apparatus includes a washing liquid supply unit which supplies a washing liquid to a washing liquid discharge port which is open in the outer circumferential surface of a body, a rotation unit which relatively rotates the opposing member and the body around a rotational axis passing through the central portion of the upper surface of the substrate and a washing control unit which controls the washing liquid supply unit and the rotation unit so as to wash the cylindrical gap, where the washing control unit performs a rotation step of controlling the rotation unit so as to relatively rotate the opposing member and the body and a washing liquid discharging step of controlling the washing liquid supply unit so as to discharge a washing liquid from the washing liquid discharge port simultaneously with the rotation step.