Substrate Processing Gas Cycling for Uniform 3D Film Coverage
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing substrate processing methods face challenges in achieving optimal step coverage of films formed on substrates, particularly in three-dimensional structures with trenches or grooves.
Innovation Solution
A method involving alternating supply of first and second processing gases through separate storage tanks and ports, with intermediate exhaust phases, to enhance film formation on substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single storage tank and single supply port are used for processing gas supply, then the device complexity is reduced, but the film step coverage on three-dimensional substrates deteriorates
Solution Approach 1:
The gas supply system is segmented into multiple storage tanks (first storage tank, second storage tank) and multiple supply ports (first supply port, second supply port). Each storage tank supplies processing gas through dedicated supply ports at different positions, enabling differentiated gas distribution to improve film step coverage on three-dimensional substrates without requiring complex centralized control systems.
Solution Approach 2:
Different supply ports are positioned at different locations to provide processing gas with different flow characteristics to different regions of the substrate. The first supply port and second supply port are arranged to create localized gas flow patterns that enhance gas penetration into trenches and grooves, achieving uniform film deposition across complex substrate topographies.
2Productivity
If processing gas is supplied continuously without intermediate exhaust, then the productivity is improved, but the film deposition uniformity deteriorates
Solution Approach 1:
The film formation process uses periodic alternating supply of first processing gas and second processing gas through different storage tanks and supply ports. This periodic action creates distinct deposition phases that ensure uniform film formation across the substrate surface while maintaining efficient productivity through continuous cyclic operation without complete system idle time.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Improves film step coverage on substrates by ensuring uniform deposition across complex topographies, enhancing the quality and consistency of film formation.
Implementation Method 1
supplying a first processing gas to the substrate... forming a film on the substrate
Implementation Method 2
supplying a second processing gas to the substrate... forming a film on the substrate
Data Source
Figure 1
Figure 2
Figure 3
AI summary
There is provided a technique that includes: forming a film on the substrate by performing a first cycle a predetermined number of times, the first cycle including performing: (a) supplying a first processing gas to the substrate; and (b) supplying a second processing gas to the substrate, wherein (a) includes sequentially performing: (a-1) opening a first storage filled with the first processing gas and supplying the first processing gas discharged from the first storage to the substrate via a first supply port; (a-2) exhausting a processing space in which the substrate is processed while stopping the supply of the first processing gas to the substrate; and (a-3) opening a second storage filled with the first processing gas and supplying the first processing gas discharged from the second storage to the substrate via a second supply port different from the first supply port.