Substrate Heat Treatment Gas Diffusion Guide for Uniform Flow

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Solution Overview

Problem

Direct gas injection in a rectilinear direction towards substrates in heat treatment devices causes non-uniform gas flow velocity, leading to stains on the substrates, which affects the quality and yield of substrates such as display panels and semiconductors.

Innovation Solution

A substrate heat treatment device is designed with a diffusion guide that deflects gas flow away from a direct path towards the substrate, using a concave surface and symmetrical wings to guide gas in an opposite direction, ensuring uniform gas flow velocity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If gas is injected directly in a rectilinear direction towards the substrate, then the gas injection structure is simple, but the gas flow velocity becomes non-uniform causing stains on the substrate

Engineering Contradiction:
Improvegas injection structureVSAvoidsubstrate quality
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

A diffusion guide is introduced as an intermediary component between the gas injection unit and the substrate. The diffusion guide includes a guide surface that redirects gas flow, preventing direct rectilinear injection onto the substrate. This mediator structure ensures uniform gas flow velocity while maintaining relatively simple overall device complexity.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Length of moving object

If gas is injected directly towards the substrate, then the gas flow path is short and direct, but stains are formed on the substrate due to non-uniform gas flow velocity

Engineering Contradiction:
Improvegas flow pathVSAvoidstains on substrate
Core Design Contradiction:
Length of moving objectVSObject-affected harmful factors

Solution Approach 1:

The diffusion guide employs a curved guide surface instead of a straight path. The guide surface is configured with specific curvature to redirect gas flow at angles (e.g., 45-60 degrees) relative to the substrate, transforming the direct rectilinear flow into a diffused, uniform flow pattern that eliminates stain formation while extending the gas flow path appropriately.

Inventive Principle:
Principle #14Spheroidality (Curvature)

3Manufacturing precision

If a diffusion guide is added to guide gas flow uniformly, then uniform gas flow velocity is achieved, but the device complexity increases

Engineering Contradiction:
Improvegas flow velocity uniformityVSAvoidheat treatment device structure
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The diffusion guide is designed to perform multiple functions simultaneously: it guides gas flow uniformly, defines the gas discharge space, and works in conjunction with the heating unit. By integrating these functions into a single component, the increase in device complexity is minimized while achieving uniform gas flow velocity for high-quality substrate treatment.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The device achieves uniform gas flow velocity, preventing stains on substrates and maintaining the quality and yield of heat-treated substrates by ensuring even temperature distribution.

Implementation Method 1

a diffusion guide positioned adjacent to the gas injection unit within the heat treatment chamber and extending along a first horizontal direction intersecting a discharge direction of the gas emitted through the gas outlet

Methodology Applied
Scientific EffectGas flow deflection:

Implementation Method 2

a heating unit located inside the heat treatment chamber and including a gas discharge hole connected to the gas outlet

Methodology Applied
Scientific EffectThermal radiation: Thermal Radiation

Implementation Method 3

substrates to be heat-treated may be positioned apart from the upper side of a heater, allowing the substrates to be uniformly heated by the heater

Methodology Applied
Scientific EffectConvection: Convection

Data Source

PatentUS20250351234A1Substrate heat treatment device
Publication Date: 2025.11.13 SAMSUNG DISPLAY CO LTD
  • US20250351234A1 patent drawing
  • US20250351234A1 patent drawing
  • US20250351234A1 patent drawing

AI summary

A substrate heat treatment device includes a heat treatment chamber having a heat treatment space, a gas injection unit located inside the heat treatment chamber and having a gas outlet configured to inject gas into the heat treatment chamber, and a diffusion guide positioned adjacent to the gas injection unit within the heat treatment chamber and extending along a first horizontal direction intersecting a discharge direction of the gas emitted through the gas outlet, wherein an inner surface of the diffusion guide facing the gas outlet includes a concave surface formed concavely along a second horizontal direction intersecting the first horizontal direction.