Substrate Treatment Gas Recycling for Temperature and Humidity Control
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Solution Overview
Problem
Existing substrate treatment systems require a large volume of clean air intake for atmosphere gas supply, which is energy-intensive and reduces the lifespan of high-performance filters.
Innovation Solution
A substrate treatment system that includes a supply apparatus to regulate the temperature and humidity of emission gases from an exposure apparatus, reusing them as atmosphere gas for coating and developing treatment apparatuses, and optionally mixing underfloor space atmosphere to adjust gas parameters within controllable ranges.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If a large volume of clean air is taken in by the supply apparatus, then the atmosphere gas can be supplied to the substrate treatment apparatus, but the energy consumption increases and filter lifespan decreases
Solution Approach 1:
The patent recovers emission gas from the exposure apparatus that would otherwise be discarded, regulates its temperature and humidity, and reuses it as atmosphere gas for the substrate treatment apparatus. This eliminates the need to continuously intake large volumes of fresh clean air, thereby reducing energy consumption and extending filter lifespan while maintaining adequate atmosphere gas supply.
2Quantity of substance
If a large volume of clean air is taken in by the supply apparatus, then the atmosphere gas can be supplied to the substrate treatment apparatus, but the filter lifespan decreases
Solution Approach 1:
The patent recovers emission gas from the exposure apparatus that would otherwise be discarded, regulates its temperature and humidity, and reuses it as atmosphere gas for the substrate treatment apparatus. This eliminates the need to continuously intake large volumes of fresh clean air, thereby reducing energy consumption and extending filter lifespan while maintaining adequate atmosphere gas supply.
3Quantity of substance
If emission gas is directly supplied as atmosphere gas, then the clean air intake volume is reduced, but the temperature and humidity may be outside controllable ranges
Solution Approach 1:
The patent changes the physical parameters (temperature and humidity) of the emission gas through regulation by the supply apparatus before supplying it as atmosphere gas. This allows the system to reduce clean air intake volume while maintaining temperature and humidity within controllable ranges suitable for substrate treatment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Reduces the required volume of clean air intake, conserves energy, extends filter life, and maintains optimal treatment conditions by effectively recycling emission gases.
Implementation Method 1
the supply apparatus regulates a temperature and/or a humidity of the emission gas taken in from the intake part
Implementation Method 2
the supply apparatus regulates a temperature and/or a humidity of the emission gas taken in from the intake part
Data Source
AI summary
A substrate treatment system connected to an exposure apparatus, includes: a substrate treatment apparatus configured to perform a treatment on a substrate; and a supply apparatus configured to supply atmosphere gas during a substrate treatment to the substrate treatment apparatus, wherein: the supply apparatus includes an intake part configured to take in emission gas emitted from the exposure apparatus; and the supply apparatus regulates a temperature and/or a humidity of the emission gas taken in from the intake part and then supplies the emission gas as the atmosphere gas to the substrate treatment apparatus.