Substrate Gas Tank Layout for Uniform Multi-Substrate Processing
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Solution Overview
Problem
Existing substrate processing technologies face challenges in uniformly processing multiple substrates due to non-uniform gas distribution and pressure variations, leading to inconsistencies in film formation.
Innovation Solution
A substrate processing apparatus with a configuration that includes a process chamber, vaporizers, gas tanks, pipes, valves, and a gas supplier, which ensures uniform gas distribution and pressure equalization across multiple substrates using a first valve to connect the gas tanks, allowing simultaneous and uniform gas supply to different regions of the substrate support tool.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single tank accumulates source gas for multiple substrates, then the device complexity is reduced, but the uniformity of gas distribution and pressure stability deteriorates
Solution Approach 1:
The single gas tank is divided into multiple separate tanks, with each tank corresponding to a specific substrate processing position. This segmentation allows independent control of gas supply to each substrate, ensuring uniform gas distribution and pressure stability across all substrates while maintaining manageable system complexity through modular design.
2Productivity
If gas is supplied to multiple substrates simultaneously from different sources, then the productivity is improved, but the pressure stability and gas distribution uniformity deteriorates
Solution Approach 1:
Multiple gas tanks are connected through a common piping system that maintains equal pressure potential across all tanks. This equipotential design allows simultaneous gas supply to multiple substrates without pressure fluctuations, ensuring consistent film formation while achieving high productivity through parallel processing.
3Manufacturing precision
If separate gas supply systems are provided for each substrate region, then the gas distribution uniformity is improved, but the device complexity increases
Solution Approach 1:
A universal gas supply system design is implemented where multiple tanks share a common piping architecture and control mechanism. Each tank can independently supply gas to its corresponding substrate region, providing the necessary gas distribution uniformity, while the shared infrastructure keeps the overall system complexity manageable compared to completely separate supply systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables uniform processing of multiple substrates by ensuring consistent gas supply and pressure equalization, thereby eliminating differences in film formation across the substrates.
Implementation Method 1
at least one vaporizer that vaporizes a source supplied as a liquid to generate a source gas
Data Source
AI summary
Included is a process chamber configured to process a substrate; at least one vaporizer that vaporizes a source supplied as a liquid to generate a source gas; at least two tanks that accumulates the source gas extracted from the vaporizer; pipe coupling the at least two tanks to each other; a first valve provided in the pipe; and a gas supplier that supplies the source gas into the process chamber from the at least two tanks.