Substrate Processing Apparatus Guide Members Liquid Control
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Solution Overview
Problem
Conventional substrate processing apparatuses face issues with process liquid reattachment onto substrates due to centrifugal forces and splashing, leading to contamination and quality deterioration, and require larger cup sizes to mitigate this, which increases apparatus height and complexity.
Innovation Solution
The apparatus incorporates guide members with inner-edge and outer-edge guides to collect and direct process liquid away from the substrate, reducing reattachments by guiding liquid into collection grooves and ensuring it is splashed outward and downward, thus minimizing reattachments and allowing for a more compact cup design.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If the cup is enlarged in radial direction to increase distance between substrate and cup, then process liquid reattachment is reduced, but apparatus height and complexity increase
Solution Approach 1:
The invention divides the cup structure into multiple segments: the cup body, multiple baffle plates arranged circumferentially, and multiple guide members. This segmentation allows each component to perform a specific function in controlling process liquid flow, reducing reattachment without requiring excessive radial enlargement of a single cup structure.
Solution Approach 2:
The invention introduces vertical dimension elements (baffle plates extending upward from the cup bottom) to control horizontal process liquid flow. By using vertical baffles to redirect horizontal splashes downward, the system reduces reattachment without needing to increase radial distance, effectively solving the problem in a different dimensional approach.
2Object-affected harmful factors
If process liquid is supplied onto substrate with atmosphere blocking plate close to substrate, then reattachment is reduced, but apparatus height increases due to required movement space
Solution Approach 1:
The invention introduces guide members as intermediary components between the process liquid and the substrate. These guide members actively redirect the process liquid flow path, preventing direct contact with the substrate without requiring the atmosphere blocking plate to be positioned close to the substrate, thereby avoiding the need for excessive apparatus height.
Solution Approach 2:
The invention extracts the atmosphere blocking plate from the immediate vicinity of the substrate by using baffle plates and guide members to control liquid flow. This allows the blocking plate to be positioned higher without compromising reattachment prevention, reducing the required apparatus height while maintaining effectiveness.
3Manufacturing precision
If chuck pins are used to hold substrate, then substrate positioning is achieved, but process liquid turns into droplets or mist at chuck pin positions causing reattachment
Solution Approach 1:
The invention applies local quality by positioning guide members specifically at the locations of chuck pins. These local guide members redirect process liquid flow precisely where it would otherwise contact the chuck pins and substrate, addressing the reattachment problem locally without affecting overall substrate positioning accuracy.
Solution Approach 2:
The invention converts the harmful effect of process liquid contacting chuck pins into a beneficial flow pattern. By strategically positioning guide members, the liquid that would otherwise splash onto the substrate is redirected to flow along the guide members and into the cup, transforming a potential contamination source into an effective liquid collection pathway.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively decreases process liquid reattachments, reduces contamination, and allows for a more compact and cost-efficient substrate processing apparatus without the need for a larger cup, enhancing processing quality and reducing operational costs.
Implementation Method 1
Receiving centrifugal forces due to rotation of the substrate, process liquid supplied to the upper face of the substrate extends outwardly over the substrate
Implementation Method 2
ensuring it is splashed outward and downward, thus minimizing reattachments
Data Source
AI summary
A substrate processing apparatus for processing a substrate comprises: a plurality of chuck pins each having an accommodating groove for accommodating a portion of peripheral part of the substrate, holding the substrate at a hold position in a horizontal posture by pressing inner faces of the accommodating grooves toward portions of peripheral part of the substrate; and a plurality of guide members, being disposed on or above the respective plurality of chuck pins, guiding process liquid discharged from the substrate to a surrounding area of the substrate; wherein each of the plurality of guide member includes: an inner-edge guide disposed at a position inward and above the accommodating groove; and an outer-edge guide disposed at a position level with or below the inner-edge guide and outward the chuck pin.