Substrate Heater Temperature Control via Segmented Steps

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Solution Overview

Problem

Existing substrate processing technologies face limitations in achieving precise temperature control beyond the control limit of the heater, which affects the inter-plane uniformity of film thickness, particularly in semiconductor miniaturization where finer precision is required.

Innovation Solution

A temperature control method that involves setting a target temperature with a second digit smaller than the first digit of the heater's control limit, dividing the temperature change into a first temperature equal to or greater than the first digit and a second temperature less than the first digit, calculating a ratio for time segmentation based on the digit difference, and controlling the heater to achieve finer temperature resolution.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the heater control limit is used as the temperature control resolution, then the device complexity is low, but the manufacturing precision of film thickness is insufficient

Engineering Contradiction:
Improvefilm thickness uniformityVSAvoidtemperature control system
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent segments the temperature control process into multiple discrete steps, where the total temperature change is divided into several smaller increments. Each increment is controlled within the heater's control limit, but the cumulative effect achieves finer temperature resolution. This segmentation allows the system to achieve high manufacturing precision without requiring a more complex heater control system.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent performs preliminary calculation of the temperature change amount and divides it into appropriate increments before executing the heating process. The control system pre-determines the number of steps and temperature increment for each step, ensuring that the final temperature achieves the desired precision while staying within the heater's control capabilities throughout the process.

Inventive Principle:
Principle #10Preliminary action

2Measurement precision

If the temperature control resolution is increased beyond the heater control limit, then the manufacturing precision improves, but the device complexity increases

Engineering Contradiction:
Improvetemperature control resolutionVSAvoidcontrol system
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent implements periodic temperature adjustments through multiple heating steps rather than a single continuous adjustment. The temperature is raised in periodic increments, with each increment staying within the heater's control limit. This periodic action allows the system to achieve higher measurement precision for temperature control without requiring the heater itself to have higher resolution capabilities.

Inventive Principle:
Principle #19Periodic action

Solution Approach 2:

The patent dynamically adjusts the temperature control strategy by calculating the appropriate number of steps and increment size based on the total temperature change required. The control system adapts the heating parameters in real-time, dividing large temperature changes into more steps and smaller increments, thereby achieving high temperature resolution dynamically without hardware modifications.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method allows for temperature control with a resolution finer than the heater's control limit, significantly improving the inter-plane uniformity of film thickness and enhancing the yield of semiconductor processing without requiring hardware modifications.

Implementation Method 1

a heater that heats an inside of the processing container

Methodology Applied
Scientific EffectHeating: Heating

Data Source

PatentUS20250051922A1Temperature control method and substrate processing apparatus
Publication Date: 2025.02.13 TOKYO ELECTRON LTD
  • US20250051922A1 patent drawing
  • US20250051922A1 patent drawing
  • US20250051922A1 patent drawing

AI summary

A temperature control method includes providing a substrate processing apparatus including a processing container, and a heater that heats the processing container; setting an amount of temperature change with respect to a target temperature having a value up to a second digit smaller than a first digit indicating a control limit value of the heater; dividing the amount of temperature change into a first temperature equal to or greater than the first digit and a second temperature less than the first digit, and calculating a ratio of dividing a time segmented by a digit difference between the first digit and the second digit, into a first time corresponding to the second temperature and a second time other than the first time; and controlling the heater to raise or lower a temperature in times before and after dividing a processing time in a processing step at the ratio.