Substrate Heater Control Across Low and High Temperature Ranges
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Solution Overview
Problem
Existing substrate heating technologies face challenges in accurately controlling temperature across a wide range, particularly in semiconductor manufacturing, where precise temperature control is crucial for film formation and modification processes, especially due to limitations in temperature measurement and power control methods.
Innovation Solution
The apparatus employs a resistance heater with a temperature detector and calculator to perform phase control at lower temperatures and zero-cross control at higher temperatures, using a combination of thermocouple detection and TCR-based calculation for precise power management, allowing for accurate temperature control in both low and high temperature ranges.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a single temperature detection method is used across all temperature ranges, then the device complexity is reduced, but the measurement precision deteriorates in extreme temperature ranges
Solution Approach 1:
The temperature detection system is segmented into two distinct methods: a thermocouple for low temperature ranges and a radiation thermometer for high temperature ranges. The controller automatically selects the appropriate detection method based on the current temperature range, ensuring high measurement precision in each range while managing system complexity through structured division of detection functions.
2Manufacturing precision
If phase control is used for power control, then the ease of operation is improved, but the manufacturing precision deteriorates in high temperature ranges
Solution Approach 1:
Different power control methods are applied to different temperature ranges: phase control is used for low temperature ranges where it provides smooth control, while zero-cross control is used for high temperature ranges where it delivers superior temperature control precision. The controller automatically selects the appropriate method based on the current temperature, ensuring optimal performance in each range.
3Manufacturing precision
If multiple power control methods are implemented, then the temperature control precision is improved across different ranges, but the device complexity increases
Solution Approach 1:
The power control system dynamically switches between phase control and zero-cross control methods based on the current temperature range. The controller continuously monitors the temperature and automatically adjusts the power control method to match the operational requirements of each temperature range, providing adaptive optimization without requiring manual intervention.
4Manufacturing precision
If temperature control is optimized for specific ranges, then the manufacturing precision is improved, but the adaptability deteriorates across wide temperature ranges
Solution Approach 1:
The temperature control system is designed with multi-functionality to handle both low and high temperature ranges effectively. By integrating two temperature detection methods (thermocouple and radiation thermometer) and two power control methods (phase control and zero-cross control), the system achieves universal applicability across wide temperature ranges while maintaining high precision in each specific range through automatic method selection.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables high-accuracy temperature control of the substrate across a wide temperature range, reducing thermal stress and improving the precision of film formation and modification processes in semiconductor manufacturing.
Implementation Method 1
a stage on which the substrate is placed and including at least one resistance heater configured to heat the substrate
Implementation Method 2
monitoring the temperature of the wafer using a radiation thermometer in a high temperature range
Implementation Method 3
a temperature calculator configured to calculate the heating temperature based on a resistance value of the at least one resistance heater
Data Source
AI summary
An apparatus for heating a substrate includes: a stage including at least one resistance heater that heats the substrate placed thereon; a temperature detector for detecting a heating temperature of the substrate; a temperature calculator for calculating the heating temperature based on a resistance value of the at least one resistance heater; a power controller for performing a power control with respect to a first power to be supplied to the at least one resistance heater such that the heating temperature becomes close to a first preset temperature by switchably applying a phase control and a zero-cross control; and a controller for switching the power control of the power controller to the phase control or the zero-cross control.