Substrate Heating Control via Processing Liquid Temperature Sensing

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Solution Overview

Problem

Existing substrate processing apparatuses face challenges in precisely controlling the processing rate due to variations in substrate material and surface conditions, which affect temperature measurement accuracy.

Innovation Solution

A substrate processing apparatus that includes a rotary holder, a processing liquid supplier, a heater with light-emitting elements, and a radiation thermometer to measure the temperature of the processing liquid non-contactually, allowing precise control of the processing rate by adjusting the heater output based on the measured liquid temperature.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If a heater is used to heat the substrate or processing liquid to improve processing efficiency, then the processing rate increases, but the temperature control precision deteriorates due to variations in substrate material and surface conditions affecting temperature measurement accuracy

Engineering Contradiction:

Improveprocessing efficiencyVSAvoidtemperature measurement accuracy

Core Design Contradiction:

ProductivityVSMeasurement precision

Solution Approach 1:

The patent introduces the processing liquid as an intermediary medium between the heater and substrate. Instead of directly measuring substrate temperature, the system measures the temperature of the processing liquid which is in contact with the substrate. The processing liquid serves as a mediator that transfers thermal information from the substrate to the temperature sensor, enabling accurate temperature monitoring without being affected by substrate material variations or surface conditions.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Adaptability or versatility

If the substrate material or surface conditions vary, then the processing requirements change, but the temperature measurement accuracy deteriorates, making it difficult to maintain consistent processing rate control

Engineering Contradiction:

Improveprocessing adaptability to different substratesVSAvoidtemperature measurement accuracy

Core Design Contradiction:

Adaptability or versatilityVSMeasurement precision

Solution Approach 1:

The processing liquid acts as a universal intermediary that interfaces with all substrate types. Since the liquid temperature can be measured consistently regardless of the substrate material, this approach provides a standardized measurement method that works across different substrate materials and surface conditions, maintaining measurement precision while adapting to various processing requirements.

Inventive Principle:

Principle #24Intermediary (Mediator)

3Measurement precision

If contact-based temperature measurement is used to achieve accurate temperature control, then the measurement precision improves, but the device complexity increases due to potential contamination and cleaning requirements

Engineering Contradiction:

Improvetemperature measurement accuracyVSAvoidsystem complexity

Core Design Contradiction:

Measurement precisionVSDevice complexity

Solution Approach 1:

The processing liquid serves as a non-intrusive intermediary that enables temperature measurement without direct contact between the sensor and substrate. The temperature sensor measures the liquid temperature, which reflects the substrate temperature through thermal equilibrium, thereby achieving accurate measurement while avoiding contamination issues and simplifying the overall system design.

Inventive Principle:

Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables precise control of the processing rate by accurately measuring the temperature of the processing liquid, even with varying substrate materials, ensuring uniform and efficient processing across the substrate surface.

Implementation Method 1

configured to emit light having a wavelength, which is absorbed in the substrate, and configured to heat the substrate by irradiating the light from the at least one light emitting element to the substrate

Methodology Applied

Scientific EffectLight absorption: Absorption (EM radiation)

Implementation Method 2

configured to measure a temperature of the processing liquid in a non-contact manner, based on light radiated from the processing liquid

Methodology Applied

Scientific EffectThermal radiation: Thermal Radiation

Data Source

PatentUS20250308948A1Substrate processing apparatus

Publication Date: 2025.10.02 SHIBAURA MECHATRONICS CORP

AI summary

A substrate processing apparatus includes: a rotary holder configured to hold and rotate a substrate; a processing liquid supplier configured to supply a processing liquid to the substrate, which is held and rotated by the rotary holder; a heater including at least one light emitting element configured to emit light having a wavelength, which is absorbed in the substrate, and configured to heat the substrate by irradiating the light from the at least one light emitting element to the substrate, which is held and rotated by the rotary holder; and a temperature measurer including a radiation thermometer configured to measure a temperature of the processing liquid in a non-contact manner, based on light radiated from the processing liquid, and configured to measure the temperature of the processing liquid, which is heated by being in contact with the substrate, by using the radiation thermometer.