Substrate Surface Modification Using HF Pre-treatment and Alkene Chemistry
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Solution Overview
Problem
The existing surface modification processes for substrates in semiconductor and liquid crystal display manufacturing are time-consuming and generate large amounts of particles due to repeated rinsing and replacement steps, and result in uneven surfaces when using chemicals with silyl or hydroxyl groups.
Innovation Solution
A method and apparatus that uses a treatment liquid containing hydrogen fluoride (HF) followed by an alkene-based chemical, with radical reactions induced by ultraviolet light or heating, to uniformly modify the substrate surface to a hydrophobic state, minimizing particle generation and controlling hydrophobicity through temperature and processing time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If repeated rinsing and replacement steps are used in surface modification, then the surface modification can be completed, but the process takes a lot of time
Solution Approach 1:
The patent applies preliminary action by performing a pre-treating step with HF treatment liquid before the main surface modification step. This preliminary treatment prepares the substrate surface by removing organic contaminants and creating a clean surface, which enables the subsequent surface modification to be completed more effectively and potentially with fewer rinsing cycles, thus reducing overall process time while ensuring modification completeness
2Reliability
If silyl or hydroxyl group containing chemicals are used for surface modification, then the surface can be modified to hydrophobic state, but the surface becomes uneven and generates large amounts of particles
Solution Approach 1:
The patent applies parameter changes by switching from traditional silyl or hydroxyl group containing chemicals to an alkene-based chemical (such as hexadecene) for surface modification. This chemical substitution changes the reaction parameters and mechanism, allowing the surface to be modified to a hydrophobic state while maintaining surface uniformity and minimizing particle generation. The alkene-based chemical reacts differently with the pre-treated substrate surface, avoiding the surface unevenness and particle generation issues associated with silyl or hydroxyl group chemicals
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves a uniform hydrophobic surface modification with reduced particle generation and allows for controlled hydrophobicity, enhancing the efficiency of the surface treatment process.
Implementation Method 1
The radical reaction may be generated by irradiating the substrate with ultraviolet light
Implementation Method 2
The radical reaction may be generated by heating the substrate
Implementation Method 3
a pre-treating step for supplying the treatment liquid containing hydrogen fluoride (HF) to the substrate and treating the substrate before the surface modification step
Data Source
AI summary
Provided is a method and apparatus for treating a substrate with a liquid. The substrate treating method comprises a pre-treating step for supplying the treatment liquid containing hydrogen fluoride (HF) to the substrate and treating the substrate before the surface modification step and a surface modification step for supplying an alkene-based chemical onto a substrate to change the surface of the substrate to a hydrophobic state. As a result, the surface of the substrate is uniform, and generation of particles can be reduced when the substrate is removed.