Substrate Holder Coupling for Flat Planarization Film Curing
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Solution Overview
Problem
Existing film forming methods using spin coaters and imprint techniques face issues with substrate deformation due to undesirable temperature distributions on movable stages, leading to compromised planarization quality.
Innovation Solution
A film forming apparatus with a kinematic coupling and attraction force generator is used to stabilize the substrate holder, minimizing deformation by generating an attraction force between the movable stage and substrate holder, maintaining flatness during curing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a curable composition is irradiated with curing energy on a movable stage, then the curable composition can be cured to form a planarization film, but temperature distribution causes deformation of the substrate holder and movable stage
Solution Approach 1:
The coupling system is segmented into a kinematic coupling for positional alignment and an attraction force generator for thermal stabilization. This segmentation allows each component to address specific issues: the kinematic coupling maintains geometric accuracy while the attraction force generator independently compensates for thermal deformation through adjustable attractive forces.
Solution Approach 2:
The attraction force generator dynamically adjusts the coupling force parameter between the substrate holder and movable stage based on temperature conditions. By changing the attraction force parameter in response to thermal expansion or contraction, the system maintains stable positioning despite temperature-induced deformation.
2Stability of the object's composition
If the substrate holder is firmly fixed to the movable stage, then positioning stability is improved, but thermal deformation cannot be compensated
Solution Approach 1:
The coupling between the substrate holder and movable stage is made dynamic through the attraction force generator. Instead of a static rigid connection, the system uses adjustable attractive forces that can respond to thermal conditions, allowing the coupling to adapt its characteristics in real-time while maintaining stability.
Solution Approach 2:
The attraction force generator operates with feedback control to monitor temperature distribution and adjust the coupling force accordingly. This feedback mechanism allows the system to detect thermal deformation and compensate for it by adjusting the attraction force, maintaining both stability and flatness.
3Device complexity
If the kinematic coupling alone is used to hold the substrate holder, then device complexity is reduced, but thermal deformation causes loss of positioning accuracy
Solution Approach 1:
The system merges the kinematic coupling with the attraction force generator into a unified coupling mechanism. This combination integrates the positional alignment function of the kinematic coupling with the thermal stabilization function of the attraction force generator, achieving both simplicity and high precision without requiring separate independent systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively reduces substrate holder deformation, ensuring high accuracy in maintaining the flatness of the planarization film, even after thermal equilibrium is reached.
Implementation Method 1
an attraction force generator configured to generate, between the movable stage and the substrate holder, an attraction force for fixing the substrate holder to the movable stage
Implementation Method 2
The curable composition can be cured by being irradiated with curing energy such as light
Data Source
AI summary
A film forming apparatus includes a movable stage; a substrate holder supported by the movable stage and configured to hold a substrate; a coupling configured to couple the movable stage and the substrate holder; and a curing unit configured to cure a curable composition on the substrate, wherein the coupling includes: a kinematic coupling; and an attraction force generator configured to generate, between the movable stage and the substrate holder, an attraction force for fixing the substrate holder to the movable stage.